“…Generally, the deposition of metal selenide thin films is a challenge to precisely control the grain size, shape and the stoichiometric composition of deposit material. Many groups have contributed to the development of In 2 Se 3 thin films by various deposition techniques including vacuum [16], modified chemical bath deposition [17,18], metalorganic chemical vapor deposition (MOCVD) [19], molecular beam epitaxy [20], sputtering [21,22], electrodeposition [23,24], thermal evaporation technique [25,26], spray pyrolysis [27,28] etc.…”