2008
DOI: 10.1016/j.apsusc.2007.09.067
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Preparation of photocatalytic Fe2O3–TiO2 coatings in one step by metal organic chemical vapor deposition

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Cited by 127 publications
(66 citation statements)
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“…Anatase TiO 2 exhibits superior photoactivity under UV light irradiation and is the most frequently used photocatalyst in water treatment process [15][16][17][18][19], but its wide band gap (3.2 eV) has obviously hindered its sufficient utilization of sunlight [20]. Therefore, some composite photocatalysts about anatase TiO 2 with visible-light response had been reported by many researchers in recent years [21][22][23][24][25][26][27][28][29][30]. For instance, Zhao et al synthesized a BiOBr-TiO 2 -graphene composite by using graphene as a nano-filler [31].…”
Section: Introductionmentioning
confidence: 99%
“…Anatase TiO 2 exhibits superior photoactivity under UV light irradiation and is the most frequently used photocatalyst in water treatment process [15][16][17][18][19], but its wide band gap (3.2 eV) has obviously hindered its sufficient utilization of sunlight [20]. Therefore, some composite photocatalysts about anatase TiO 2 with visible-light response had been reported by many researchers in recent years [21][22][23][24][25][26][27][28][29][30]. For instance, Zhao et al synthesized a BiOBr-TiO 2 -graphene composite by using graphene as a nano-filler [31].…”
Section: Introductionmentioning
confidence: 99%
“…22,23 However, high doping levels often lead to heterogeneous materials. 24,25 Their functionality is then the result of both the bulk properties of the various components and their interface properties. We note that some reports in the literature highlight the benefit of designing heterojunctions to enhance the charge separation.…”
mentioning
confidence: 99%
“…So far, a number of experimental researches have been successfully conducted in the area of TiO 2 doping process. The most popular dopants for this purpose are Ag, Fe, V, Au, Pt, etc., which have been doped by many production methods including: ion-assisted sputtering, plasma, ion-implantation, sol-gel [10] and chemical vapour deposition (CVD) [11]. In these processes the electrochemical oxidation of the dopant is not favourable and the doping agent should be remained mainly in the metallic state.…”
Section: Introductionmentioning
confidence: 99%