Polymer Thin Films 2010
DOI: 10.5772/8389
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Preparation of Polyimide Thin Films by Vapour Deposition and Solid State Reactions

Abstract: In this chapter we describe the preparation of polyimide thin films by physical vapour deposition and comment on their potential application as a pure material or a thin layer matrix for producing nanocomposite layers. Their superb properties, such as a low dielectric constant, high thermal-and photo-stability, high chemical resistance and high optical transmittance predetermine their wide-spread applications as a casts and layers used as insulators, protective or capsulation layers, mechanical or diffusion ba… Show more

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Cited by 9 publications
(13 citation statements)
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“…Teflon Polyimide Teflon It is known [3] that an exchange of charges between the ions that come from the gas discharge and a polymer film surface according to the mechanism of Auger neutralization occurs in the process of charging. As a result, the electret homo-charge appears.…”
Section: µMmentioning
confidence: 99%
“…Teflon Polyimide Teflon It is known [3] that an exchange of charges between the ions that come from the gas discharge and a polymer film surface according to the mechanism of Auger neutralization occurs in the process of charging. As a result, the electret homo-charge appears.…”
Section: µMmentioning
confidence: 99%
“…These processes are to great extent accelerated and controlled in the thermal treatment of the condensed solid phase which represents PAA, with regard to their transformation to PI by means of reaction of polycyclodehydration in solid state to linear PI [7,10,11]. The FTIR spectra of individual films of PMDA, ODA and PAA are shown in figure 2.…”
Section: Vapour Deposition and Solid State Reactionmentioning
confidence: 99%
“…Our studies have focused primarily on vapour deposition of precursors and solid state imidization reaction [7,10,11,12]. Vapour deposition processes of organic layers play an important role in polytronics.…”
Section: Vapour Deposition and Solid State Reactionmentioning
confidence: 99%
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