1996
DOI: 10.1016/0368-2048(96)02931-3
|View full text |Cite
|
Sign up to set email alerts
|

Preparation of ZnO thin films using undulator and ArF excimer laser

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

1
2
0

Year Published

2001
2001
2005
2005

Publication Types

Select...
3

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(3 citation statements)
references
References 7 publications
1
2
0
Order By: Relevance
“…3, the band gap energy of ZnO is found to be 3.23 eV, which is similar to the reported band gap of ZnO. [6][7][8][9][10][11][12] The CL spectrum at room temperature under excitation by a 15 kV electron beam from the ZnO film, is shown in Fig. 4, which exhibits a strong UV emission band at 3.2 eV.…”
supporting
confidence: 79%
See 2 more Smart Citations
“…3, the band gap energy of ZnO is found to be 3.23 eV, which is similar to the reported band gap of ZnO. [6][7][8][9][10][11][12] The CL spectrum at room temperature under excitation by a 15 kV electron beam from the ZnO film, is shown in Fig. 4, which exhibits a strong UV emission band at 3.2 eV.…”
supporting
confidence: 79%
“…The deep-level emission was found to be weak in epitaxial films but almost dominated in polycrystalline ZnO films. [6][7][8][9][10][11][12][15][16][17] The fact that we observe a strong near-band-edge emission in the UV region without any deep-level emissions at room temperature from our sample as shown in Fig. 4 indicates MOD is a promising growth method for obtaining high-quality ZnO films.…”
mentioning
confidence: 59%
See 1 more Smart Citation