2016
DOI: 10.1016/j.ultramic.2016.09.014
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Preventing probe induced topography correlated artifacts in Kelvin Probe Force Microscopy

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Cited by 9 publications
(8 citation statements)
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“…For example, Kelvin probe force microscopy (KPFM) and electric force microscopy (EFM) measured the built-in potential in single PbS–CdS and CdS–Cu 2 S nanorods, respectively. , However, the characterization of nanoscale interfaces by probe methods is sensitive to the surface of the semiconductor, which often has different properties from the interior of the structure . Moreover, probe methods are limited to planar structures due to geometrical limitations . Such studies are occasionally accompanied by TEM analysis which can determine the composition and crystal structure, even at atomic scale lateral resolution …”
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confidence: 99%
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“…For example, Kelvin probe force microscopy (KPFM) and electric force microscopy (EFM) measured the built-in potential in single PbS–CdS and CdS–Cu 2 S nanorods, respectively. , However, the characterization of nanoscale interfaces by probe methods is sensitive to the surface of the semiconductor, which often has different properties from the interior of the structure . Moreover, probe methods are limited to planar structures due to geometrical limitations . Such studies are occasionally accompanied by TEM analysis which can determine the composition and crystal structure, even at atomic scale lateral resolution …”
mentioning
confidence: 99%
“…14 Moreover, probe methods are limited to planar structures due to geometrical limitations. 15 Such studies are occasionally accompanied by TEM analysis which can determine the composition and crystal structure, even at atomic scale lateral resolution. 13 An additional capability of TEM is OAEH, which can map variations in electrostatic potential at high lateral resolution, around 1 nm, and with a stated potential sensitivity of 30 mV.…”
mentioning
confidence: 99%
“…4d) insets). Here, the use of uniformly PtIr-coated tips, enables avoidance of the topography correlated artifacts, unlike some previous studies [36]. Taking into account the opening angle of about 40 degrees and the nanowires' average height of 18(8) nm, the tip diameter at the level of nanowires top surface would be about 40 nm, meaning that the CPD resolution is approaching the topography resolution which is the ultimate physical limit of FM-KPFM technique [11].…”
Section: Resultsmentioning
confidence: 97%
“…We have studied the work function and surface potential distribution of the perovskite films by the KPFM technique in the dark (Figure 5). KPFM is a powerful tool for measuring the 31 The increase in perovskite grain size by probe sonication also helps in increasing the absorption coefficient and path length of light propagation. 4,32 With a larger grain size in the compact films, the absorbance of the sonicated perovskites is higher and red-shifted than the pristine M0 and CF0 (Figure 6a,d).…”
Section: ■ Results and Discussionmentioning
confidence: 99%