“…The contact materials used in n-type solution-processed metal oxide semiconductor TFTs are generally similar to those employed for their vacuum-processed counterparts. Source/drain and gate electrodes are mostly made of Al and Au, 145,193,231 but also of transparent conducting metal oxides, such as ITO, 76,83,190,196,197 IZO, 220,221 or zinc indium tin oxide (ZITO). 192 In addition to the above mentioned materials, gate contacts are also made of Cr 145 or dual layers of Cr/Au, 220,221 which yield a good adhesion.…”