1998
DOI: 10.1016/s0039-6028(98)00604-9
|View full text |Cite
|
Sign up to set email alerts
|

Probing molecular orientation in corrosion inhibition via a NEXAFS study of benzotriazole and related molecules on Cu(100)

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

7
88
0

Year Published

2007
2007
2023
2023

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 63 publications
(95 citation statements)
references
References 31 publications
7
88
0
Order By: Relevance
“…Such scenario was recently demonstrated for benzotriazole on copper surfaces [12]; the respective activation barrier for the N-H bond cleavage was calculated to be 1.14 eV on Cu(111) [12], which is significantly larger than the current E * values of thiones, and yet the dissociation was found plausible on more open surfaces and low-coordinated defects [12]. It was also observed experimentally that the H1 atom of benzotriazole is removed upon chemisorption on copper surfaces, including the Cu(111), even under ultra-high-vacuum conditions [23,46,[79][80][81]. On this basis, we can reasonably conclude that the current-mercapto molecules should exist in dehydrogenated (deprotonated) thiolate form on Cu(111).…”
Section: Dissociation Of Mercapto-molecules On Cu(111)mentioning
confidence: 92%
“…Such scenario was recently demonstrated for benzotriazole on copper surfaces [12]; the respective activation barrier for the N-H bond cleavage was calculated to be 1.14 eV on Cu(111) [12], which is significantly larger than the current E * values of thiones, and yet the dissociation was found plausible on more open surfaces and low-coordinated defects [12]. It was also observed experimentally that the H1 atom of benzotriazole is removed upon chemisorption on copper surfaces, including the Cu(111), even under ultra-high-vacuum conditions [23,46,[79][80][81]. On this basis, we can reasonably conclude that the current-mercapto molecules should exist in dehydrogenated (deprotonated) thiolate form on Cu(111).…”
Section: Dissociation Of Mercapto-molecules On Cu(111)mentioning
confidence: 92%
“…benzotriazole, BTA) in acidic solutions was suggested [23,27,30,31]. Addition of BTA results in the formation of tightly adherent Cu-BTA protective layer film at the metal surface [32][33][34][35][36][37][38], which blocks copper surface removal, leading to a decrease in copper dissolution rate. Many authors [23,27,30,39] indicated that this protective layer may posses the characteristics of a passive oxide film during CMP process: a removal of copper-inhibitor film from the surface of the copper during CMP would result in an active dissolution of bare copper sites.…”
Section: Nitric Acid (Hno 3 ) Based Cmp Slurrymentioning
confidence: 99%
“…It has also been reported to inhibit the corrosion of iron [26][27][28], cobalt [29], zinc [30], and nickel [28] and to enhance the resistance of tin bronze to oxidation in air [31]. The remarkable inhibiting efficiency of BTAH is attributed to adsorption [32][33][34] and complex formation [34][35][36][37][38], i.e.,…”
Section: Introductionmentioning
confidence: 99%