2000
DOI: 10.1063/1.481391
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Probing nanoscale photo-oxidation in organic films using spatial hole burning near-field scanning optical microscopy

Abstract: Spatial hole burning near-field scanning optical microscopy ͑SHB-NSOM͒ is used to locally photopattern three species of organic thin films, poly͑2-methoxy, 5-͑2Ј-ethyl hexyloxy͒p-phenylene vinylene͒ ͑MEH-PPV͒, tris-8-hydroxyquinoline aluminum (Alq 3 ) and dye-functionalized polyelectrolyte self-assembled layers, on a 100 nm length scale. In SHB-NSOM the film is illuminated with light from a stationary NSOM tip to induce photo-oxidation. The reduction in the fluorescence yield resulting from this exposure is th… Show more

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Cited by 26 publications
(25 citation statements)
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“…[15] Recently it has been shown for thin organic films that the photooxidation kinetics of a poly(phenylene vinylene) derivative is more than 10 times faster than for Alq 3 . [16] …”
Section: The Effect Of Water Vapormentioning
confidence: 99%
“…[15] Recently it has been shown for thin organic films that the photooxidation kinetics of a poly(phenylene vinylene) derivative is more than 10 times faster than for Alq 3 . [16] …”
Section: The Effect Of Water Vapormentioning
confidence: 99%
“…Buratto and co-workers studied the electronic properties of stretch-oriented PPV films using PL 33 and photoconductivity 34,69 NSOM. Credo et al 70 as well as McNeill et al 71 have studied carrier mobility in MEH-PPV films using photo-oxidation and electric-field-modulated PL NSOM, respectively. Teetsov and Vanden Bout used PL NSOM to observe ordered domains in annealed thin films of 9,9-dialkylpolyfluorenes 28,29 that exhibited high polarization ratios.…”
Section: A Background: Spectral Signature Of Interchain Species In Cmentioning
confidence: 99%
“…The annealing temperature of 140 -C was selected from our AFM observations as discussed below. These results suggest that there is no detectable chemical and structural change among the Alq 3 thin films annealed in O 2 and N 2 , indicating that no tangible thermal oxidation of the Alq 3 thin film in O 2 exists although photo-oxidation has been previously reported under UV light [16,17].…”
Section: Vt-afm Measurements Under O 2 and Nmentioning
confidence: 65%