“…In view of this, it is now possible to obtain extremely precise control of the quantum properties of electrons confined in silicon CMOS compatible structures even during fabrication [ 4 , 5 ] and it is also possible to engineer devices precise to a single atom level [ 21 , 22 , 23 , 24 ]. These new enhanced fabrication capabilities have translated into an improved ability for the control of all the quantum degrees of freedom (for example spin, charge, pseudo-spin) of electrons [ 8 , 9 , 10 , 11 , 12 , 13 , 14 , 15 , 16 , 17 , 20 , 21 , 22 , 23 , 24 ] and holes [ 25 ] in silicon nanostructures [ 4 , 5 ]. Finally, although there are still a few open questions in this area, for example see Reference [ 4 ], the achievements described above have translated into improved control of the electronic signature that can be observed in these devices.…”