Process Variations in Microsystems Manufacturing

Abstract

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Applications of reticular diversity in metal–organic frameworks: An ever-evolving state of the art

“…Conductivity is a key feature for electronic devices and research into new conductive materials is fundamental for the development of modern technology. In the last 20 years the focus of technological advancement shifted towards micro and nano applications, revealing new challenges [405][406][407]. Recently, MOFs showed conductive properties that can be tuned and improved by applying rational design strategies and PSMs [408][409][410].…”

Towards a Tailored Engineering Design Process for Individualized Micro-Mechatronic Systems with a Novel Case-Based Methodology

“…The European Commission expressed the importance in a strategy excerpt that MMS are not only essential to digital products and services, but they also underpin innovation and competitiveness for all major economic sectors [5,6]. However, the increasing demand for individualization poses great challenges to the engineering of MMS, as the entire MMS manufacturing process is based on the concept of large-scale production [7]. The reason for a large-scale production strategy is that MMS are often components of standardized mass products such as smartphones, automobiles or computers [4,8].…”

Review—Important Considerations Regarding Device Parameter Process Variations in Semiconductor-Based Manufacturing

“…The material in this review paper is covered in far more detail in a recently released volume entitled: "Process Variations in Microsystems Manufacturing." 3 Prior Work on Process-Induced Parameter Variations:…”

“…For example, MEMS and NEMS technologies span an enormously vast array of different and diverse device technologies including: pressure sensors; inertial sensors; magnetic sensors; light sensors; infrared sensors; microfluidic; micropumps; microvalves; lab-on-a-chip; digital light displays, and many more. 3 Each of these device types will usually have its own unique process sequence. Additionally, many of these technologies, such as MEMS and NEMS, have mechanical and/or electromechanical functionality and therefore have behavior that is more susceptible to process-induced parameter variations and generally require higher levels of manufacturing precision.…”

“…82 More useful generalized methods of analysis and methods for managing these process-induced device parameter variations are needed. 3…”