2010
DOI: 10.1088/0960-1317/21/1/017001
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Processing of photosensitive APEX™ glass structures with smooth and transparent sidewalls

Abstract: Improvement of the surface roughness and optical transparency of microstructures lithographically fabricated in APEX TM glass was accomplished through a post-etch anneal. An optimal dose of UV radiation is found to be 24 J g −1 for a wavelength of 280 nm, after which etch rate in HF acid and selectivity saturate. The anneal process, while originally designed to improve the surface roughness by reflowing, can be used to join multiple structures for the creation of optically transparent three-dimensional devices… Show more

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Cited by 12 publications
(17 citation statements)
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“…A process to fabricate microstructures from Apex ™ photosensitive glass with smooth sidewalls and transparent in the near UV, visible and Near IR regions was presented in [9]. Briefly, the process starts by irradiating photosensitive glass to UV light to receive a certain dose, during this step a reaction occurs in which cerous (Ce 3+ ) ions are photo oxidized to Ce 3++ ion and electron pairs as suggested by Brandily-Anne et.…”
Section: Sample Preparationmentioning
confidence: 99%
See 4 more Smart Citations
“…A process to fabricate microstructures from Apex ™ photosensitive glass with smooth sidewalls and transparent in the near UV, visible and Near IR regions was presented in [9]. Briefly, the process starts by irradiating photosensitive glass to UV light to receive a certain dose, during this step a reaction occurs in which cerous (Ce 3+ ) ions are photo oxidized to Ce 3++ ion and electron pairs as suggested by Brandily-Anne et.…”
Section: Sample Preparationmentioning
confidence: 99%
“…Depending on the glass composition, and method of exposure, the surface roughness after this step is in the range 0.7-5 11m [6,9].…”
Section: Sample Preparationmentioning
confidence: 99%
See 3 more Smart Citations