Production and characterisation of carbon nitride thin films produced by a graphite hollow cathode system

Mühl, S.; Gaona-Couto, Adriana; Méndez, José Manuel Gómez y; Rodil, Sandra E.; González, Gonzalo; Merkulov, A.; Asomoza, R.

doi:10.1016/s0040-6090(97)00377-5

Cited by 22 publications

(15 citation statements)

References 22 publications

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“…These includes electron cyclotron resonance microwave plasma chemical vapor deposition [7], rf magnetron sputtering, [8], graphite hollow cathode system [9], hollow cathode discharge [10], and radio frequency plasma enhanced chemical vapor deposition (rf-PECVD) [11]. Among these rf PECVD is favoured since this technique has the advantage of uniform large area deposition, easy handling, low pinhole density, good adhesion and good step coverage [11].…”

Section: Introductionmentioning

confidence: 99%

Effect of RF power and annealing on chemical bonding and morphology of a-CNx thin films as humidity sensor

Aziz¹,

Ritikos²,

Kamal³

et al. 2013

AIP Conference Proceedings

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Structural and electronic properties of electron cyclotron resonance plasma deposited hydrogenated amorphous carbon and carbon nitride films Journal of Applied Physics 91, 4154 (2002) Abstract. Amorphous carbon nitride (a-CN x ) thin films were deposited using radio frequency plasma enhanced chemical vapor deposition (rf-PECVD) technique. A set of a-CN x thin films were prepared using pure methane (CH 4 ) gas diluted with nitrogen (N 2 ) gas. The rf power was varied at 50, 60, 70, 80, 90 and 100 W. These films were then annealed at 400 o C in a quartz tube furnace in argon (Ar) gas. The effects of rf power and thermal annealing on the chemical bonding and morphology of these samples were studied. Surface profilometer was used to measure film thickness. Fourier transform infra-red spectroscopy (FTIR) and Field emission scanning electron microscopy (FESEM) measurements were used to determine their chemical bonding and morphology respectively. The deposition rate of the films increased constantly with increasing rf power up to 80W, before decreasing with further increase in rf power. Fourier transform infra-red spectroscopy (FTIR) studies showed a systematic change in the spectra and revealed three main peaks included C-N, C=N, C=C and C≡N triple bond. C=N and C≡N bonds decreased with increased C-N bonds after thermal annealing process. The FESEM images showed that the structure is porous for as-deposited and covered by granule-like grain structure after thermal annealing process was done. The resistance of the a-CN x thin film changed from 23.765 kΩ to 5.845 kΩ in the relative humidity range of 5 to 92 % and the film shows a good response and repeatability as a humidity sensing materials. This work showed that rf power and thermal annealing has significant effects on the chemical bonding and surface morphology of the a-CN x films and but yield films which are potential candidate as humidity sensor device.

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Section: Introductionmentioning

confidence: 99%

Effect of RF power and annealing on chemical bonding and morphology of a-CNx thin films as humidity sensor

Aziz¹,

Ritikos²,

Kamal³

et al. 2013

AIP Conference Proceedings

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“…Up to now the results reported only show the existence of nanocrystals (β and α phases) embedded in an amorphous film. [4][5][6][7][8][9][10][11][12][13][14][15] Chen et al studying the effect of methane concentration found that their samples had a mixture of β and α phases of C 3 N 4 and tetragonal and monoclinic phases of C-N. 4 On the theoretical side, several studies of the electronic structure and structural properties of the beta phase have been done. Corkill and Cohen 16 calculated the quasiparticle band gap of the beta phase using the GW approximation, they found an indirect band gap of 6.4 eV and a direct gap at Γ of 6.75 eV.…”

Section: Introductionmentioning

confidence: 99%

ELECTRONIC STRUCTURE OF SIX PHASES OF C₃N₄: A THEORETICAL APPROACH

Molina

Sansores

1999

Mod. Phys. Lett. B

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A systematic study of the structural properties and electronic structure of six phases of C 3 N 4 is presented. The phases under study are the β, α, cubic, pseudocubic and two graphitic with different space group. The structural analysis shows that only in β and graphitic phases the N atoms behave in a pure sp 2 configuration. In the other phases, α, cubic and pseudocubic, the N with its 3 C neighbors form a pyramid. The band structure for each of the six phases is presented indicating with β, α and cubic phases have an indirect gap while the pseudocubic and the two graphitic phases have a direct gap. Also charge density contours are presented and analyzed.

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“…Previous reports claimed that carbon nitride films have bigger tendency to form an amorphous phase and amorphous carbon nitride (a-CNx) (Aziz et al 2013a;Muhl et al 1997;Othman et al 2011). The a-CN x films possess interesting properties such as low friction coefficient (Sung & Sung 1996), electrical resistance and capacitance responses (Lee & Lee 2004).…”

Section: Introductionmentioning

confidence: 99%

Characterization of a-CNx Thin Films Prepared by RF-PECVD Technique for Humidity Sensor

Awang¹,

Aziz

Purhanudin

et al. 2017

JSM

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In this work, amorphous carbon nitride (a-CN x ) thin films were deposited by radio frequency (RF) plasma enhanced chemical vapor deposition (RF-PECVD Dalam penyelidikan ini, filem nipis karbon nitrida amorfus (a-CN x ) disediakan menggunakan teknik pemendapan wap kimia secara peningkatan plasma (RF-PECVD) berfrekuensi radio (RF). Kuasa RF dan kadar aliran campuran gas yang terdiri daripada metana (CH 4 ) dan nitrogen (N 2 ) dikekalkan malar, manakala jarak elektrod diubah pada 1 hingga 6 cm. Kesan perubahan jarak elektrod semasa proses pemendapan filem ke atas ikatan kimia, morfologi dan tindak balas pengesanan kelembapan filem dikaji. Pencirian menggunakan spektroskopi transformasi Fourier inframerah (FTIR) menunjukkan perubahan sistematik pada spektrum dan menunjukkan tiga puncak utama yang dikenali sebagai puncak G dan D, ikatan ganda tiga C≡N dan kumpulan C-H/O-H. Filem a-CN

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Production and characterisation of carbon nitride thin films produced by a graphite hollow cathode system

Cited by 22 publications

References 22 publications

Effect of RF power and annealing on chemical bonding and morphology of a-CNx thin films as humidity sensor

Effect of RF power and annealing on chemical bonding and morphology of a-CNx thin films as humidity sensor

ELECTRONIC STRUCTURE OF SIX PHASES OF C₃N₄: A THEORETICAL APPROACH

Characterization of a-CNx Thin Films Prepared by RF-PECVD Technique for Humidity Sensor

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Production and characterisation of carbon nitride thin films produced by a graphite hollow cathode system

Cited by 22 publications

References 22 publications

Effect of RF power and annealing on chemical bonding and morphology of a-CNx thin films as humidity sensor

Effect of RF power and annealing on chemical bonding and morphology of a-CNx thin films as humidity sensor

ELECTRONIC STRUCTURE OF SIX PHASES OF C3N4: A THEORETICAL APPROACH

Characterization of a-CNx Thin Films Prepared by RF-PECVD Technique for Humidity Sensor

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ELECTRONIC STRUCTURE OF SIX PHASES OF C₃N₄: A THEORETICAL APPROACH