Production and properties of conducting carbon films

Pirker, K.; Schallauer, R.; Fallmann, W.; Olcaytug, F.; Urban, G.; Jachimowicz, A.; Köhl, F.; Prohaska, O.

doi:10.1016/0040-6090(86)90222-1

Cited by 9 publications

(1 citation statement)

References 6 publications

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“…18 . 42 The observation that initial resistivity and resistance change behave differently with increasing substrate temperature suggests that the structural features which control these two film characteristics are different. The structural features responsible for initial resistivity respond differently to increasing substrate temperature than the structural features responsible for the time dependent resistance.…”

Section: Resultsmentioning

confidence: 97%

Time dependence of the resistance of sputtered carbon films

Jensen

Hoffman

1991

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Electrical resistance and the timedependent oxidation of semicontinuous bismuth filmsThe electrical resistance of carbon films sputtered under high Ar pressure and low bias was observed to increase by as much as 200% when the films were exposed to the atmosphere for a period of several days. Substrate temperature and sputtering power had no effect on the time dependence of the resistance. The time dependence of the resistance appears to be related to the formation of a porous structure when films are sputtered under high Ar pressure and low bias. The increase in resistance noted when sputtered carbon films were exposed to air bears some similarity to aging behavior observed for discontinuous metal films. The initial resistivity of the films was dependent on Ar pressure, bias, substrate temperature and power.

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Section: Resultsmentioning

confidence: 97%