A cluster-ion source has been developed to produce stable ion beams of metal-cluster-complex ions. As a metal cluster complex, triosmium dodecacarbonyl, Os 3 (CO) 12 , was used, which has a molecular weight of 906.7. Using the ion source, energy dependence of beam current and sputtering yield of silicon bombarded with Os 3 (CO) n + (n = 7-8) were investigated at beam energies from 2 to 10 keV under the normal incidence condition.