Progress and perspectives in dry processes for leading-edge manufacturing of devices: toward intelligent processes and virtual product development

Abstract

Semiconductor device production has grown year on year, with high-volume manufacturing supported by advances in plasma processes. In plasma-based processing, ions and reactive species synergistically enhance chemical reactions, whose kinetics is in a nonequilibrium state in the region of the surface subjected to ion bombardment. To control such processing, methods for process monitoring, equipment control, modeling and simulation, and controlling plasma-induced damage, are required. Here, we conduct a systematic review of the literature over the last 40 years to evaluate the history and progress of dry processes in regard to intelligent process-control. We also address the challenges of implementing “virtual product development” utilizing information technology.

Measuring Electron Temperature Using Pulsed and Floating Probe Method in Low-Pressure Gas Discharge Plasmas

“…From the V -I characteristics, T e was calculated according to Maxwell's distribution using the Langmuir probe method. In (1), T e depends on the derivative of the logarithm of electron current (I e ) with respect to the applied probe voltage V , which is given as follows:…”

“…Throughout this process, the plasma must be maintained at the optimal process conditions with carefully adjusted plasma parameters. For advancements in process plasma, it is crucial to control the plasma more precisely and improve the plasma parameter measurement technology [1]. Several methods for measuring plasma levels have been reported, such as the probe method that involves directly inserting a probe into the plasma.…”

Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies

“…Cost reduction and simplification are expected to be obtained in virtual experiments that require numerical computations based on theories and stored fundamental datasets. 17) Automation of plasma processing has been addressed for a long time. Statistical process control (SPC) was developed in the 1980s 18) and was based on the design of experiments proposed by Taguchi.…”

Functional nitrogen science based on plasma processing: quantum devices, photocatalysts and activation of plant defense and immune systems

“…239) The other diagnostics in the semiconductor fabrication were reviewed elsewhere. 240) In addition, the line-of-sight concentrations of atomic nitrogen and NO in an atmospheric air plasma were systematically examined using a combination of the VUVAS and LIF techniques. 241) Plasma chemistry is distinct from combustion chemistry.…”