Projectile charge and velocity effect on UO2 sputtering in the nuclear stopping regime

Sputtering induced by highly charged 208Pbq+ bombardment on Al surface

“…The angular distribution sputtered atoms by HCIs impact has been discussed in [28,29], whose results show only the effects of linear collision cascade without any effects of potential energy. However, in our experiment the yield dependent on projectile charge state is evident and the results cannot be explained by the existent kinetic sputtering theory.…”

AODO: Secondary ion emission and surface modification

“…Thus, they offer the unique possibility to study the contribution of the different physical mechanisms of energy deposition to surface modification and sputtering. For example, angular distributions of emitted neutrals (catcher technique) [7,8] or secondary ion mass spectra (''time-of-flight" TOF) of sputtered particles from uranium dioxide (UO 2 ) both at high energy in the electronic stopping regime (%MeV/u) and with very low energy highly charged ions (%q keV) [7,9] were performed at GANIL.…”