Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator

The role of MEMS in maskless lithography

“…The idea of a ''programmable mask'' can also be found in maskless electron beam concepts [18][19][20][21]. The miniature mirror is replaced by a small deflector that moves a part of the beam (a beamlet) onto a beam stop.…”

Status and future of maskless lithography

“…Mapper develops a low energy electron optic column (5 kV), Leica develops a high energy electron optic column (100 kV) [3,4]. The projects are at the end of the first phase and it is expected that a proof of concept will be demonstrated by the end of 2005.…”

Electron caustic lithography

“…This has led to innovative approaches such as SCALPEL which utilises the angular scattering properties of electrons, rather than absorption in the mask, to create intensity variations across a resist. 2,8,9,11 In addition there has been a development of maskless approaches, including the use of multiple beams, 14,15 low energy electron microscopy, 10 and reflective electron beam lithography (REBL) wherein the electron beam is reflected by an array of electrostatic mirrors. 12,13 In this letter we describe a complementary approach to REBL and electron projection lithography which is based on the formation of intense electron caustics which can be subsequently projected onto a resist by suitable electron optics.…”