Status and future of maskless lithography

Henry, Daniel; Gemmink, Jan Willem; Pain, Laurent; Postnikov, Sergei V.

doi:10.1016/j.mee.2005.12.016

Cited by 13 publications

(7 citation statements)

References 5 publications

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“…Scanning-electron-beam lithography (SEBL) is widely used in research and to a limited extent in manufacturing [1]. The throughput is limited by the serial nature of the exposure.…”

Section: Scanning-electron-beam Lithography (Sebl)mentioning

confidence: 99%

Zone-plate-array lithography: A low-cost complement or competitor to scanning-electron-beam lithography

Smith

Menon

Patel

et al. 2006

Microelectronic Engineering

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“…Scanning-electron-beam lithography (SEBL) is widely used in research and to a limited extent in manufacturing [1]. The throughput is limited by the serial nature of the exposure.…”

Section: Scanning-electron-beam Lithography (Sebl)mentioning

confidence: 99%

Zone-plate-array lithography: A low-cost complement or competitor to scanning-electron-beam lithography

Smith

Menon

Patel

et al. 2006

Microelectronic Engineering

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“…Maskless lithography is a technique that adopts a spatial light modulator (SLM) instead of photomasks [1][2][3][4]. The pattern of the conventional mask-based lithography resembles the shape of the photomask.…”

Section: Introductionmentioning

confidence: 99%

Measuring two-dimensional profiles of beam spots in a high-density spot array for a maskless lithography system

Kang

Hahn

2014

Appl. Opt.

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We measure two-dimensional (2D) profiles of beam spots in a high-density spot array for a maskless lithography system. Since the size of each spot is comparable to that of a pixel in a charge-coupled device (CCD), we detect image frame data, which are the distribution of the intensity of the spot overlapped on the active area of the pixel in the CCD, by scanning with a nano-stage. Using the image frame data of the scanning CCD we determine reconstructed images of the beam spot array. We calculate the 2D profile of each spot by taking the deconvolution of the reconstructed image of the spot with the active area of the CCD pixel. We theoretically analyze the uncertainty in the measurement of profiles in terms of spot size for the variation of the scanning step of the nano-stage and determine the step size to achieve uncertainty of less than 100 nm. We experimentally demonstrate the measurement of profiles of an 11×11 spot array for the proof of concept. Also, we analyze various parameters of the spot array, such as ellipticity, rotation of the spot profile, spot size, intensity distribution, and position.

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“…Recent research on maskless lithography takes various aspects, and the wavefront of coherent light waves is effectively manipulated for application to technically advanced devices [13][14][15][16]. Patterns to be recorded on a hologram material can be easily and efficiently controlled when the DMD is used as a dynamic pattern generator in a holographic lithography system.…”

Section: Introductionmentioning

confidence: 99%

Phase-conjugate holographic lithography based on micromirror array recording

2011

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We present phase-conjugate holographic lithography with a hologram recorded by a digital micromirror device (DMD) and a telecentric lens. In our lithography system, a phase-conjugate hologram is applied instead of conventional masks or reticles to form patterns. This method has the advantage of increasing focus range, and it is applicable to the formation of patterns on fairly uneven surfaces. The hologram pattern is dynamically generated by the DMD, and its resolution is mainly determined by the demagnification of the telecentric lens. We experimentally demonstrate that our holographic lithographic system has a large focus range, and it is feasible to make a large-area hologram by stitching each pattern generated by the DMD without a falling off in resolution.

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Status and future of maskless lithography

Cited by 13 publications

References 5 publications

Zone-plate-array lithography: A low-cost complement or competitor to scanning-electron-beam lithography

Zone-plate-array lithography: A low-cost complement or competitor to scanning-electron-beam lithography

Measuring two-dimensional profiles of beam spots in a high-density spot array for a maskless lithography system

Phase-conjugate holographic lithography based on micromirror array recording

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