1990
DOI: 10.1063/1.345055
|View full text |Cite
|
Sign up to set email alerts
|

Properties and device applications of hydrogenated amorphous silicon carbide films

Abstract: Articles you may be interested inPhotoluminescence properties and crystallization of silicon quantum dots in hydrogenated amorphous Si-rich silicon carbide films

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

1
4
0
1

Year Published

1992
1992
2020
2020

Publication Types

Select...
5
2
1

Relationship

0
8

Authors

Journals

citations
Cited by 20 publications
(6 citation statements)
references
References 27 publications
1
4
0
1
Order By: Relevance
“…From figure 2, an average diffusion potential (V D ) of about 0.8 V is obtained. This value agrees with V D = 0.8 V and V D = 0.9 V obtained by Rahman et al in n + a-Si 1−x C x :H/p c-Si [5] and Rahman and Furukawa in p + a-Si 1−x C x :H/n c-Si heterojunctions [4] respectively. In addition, from equation (1) and assuming N D > N A , the average carrier concentration in the p side of c-Si is found to be N A ≈ 1.1 × 10 16 cm −3 which agrees with the resistivity of c-Si, in the range 1-10 cm.…”
Section: Capacitance-voltage Characteristicsupporting
confidence: 91%
See 1 more Smart Citation
“…From figure 2, an average diffusion potential (V D ) of about 0.8 V is obtained. This value agrees with V D = 0.8 V and V D = 0.9 V obtained by Rahman et al in n + a-Si 1−x C x :H/p c-Si [5] and Rahman and Furukawa in p + a-Si 1−x C x :H/n c-Si heterojunctions [4] respectively. In addition, from equation (1) and assuming N D > N A , the average carrier concentration in the p side of c-Si is found to be N A ≈ 1.1 × 10 16 cm −3 which agrees with the resistivity of c-Si, in the range 1-10 cm.…”
Section: Capacitance-voltage Characteristicsupporting
confidence: 91%
“…For example, Rahman and Furukawa [4] deposited a 60 nm p + -type a-Si 1−x C x :H layer by glow discharge on n-type crystalline silicon and found that the current was dominated by recombination and tunnelling at low temperatures (T < 340 K) and thermal injection at high temperatures (T > 340 K). In another study Rahman et al [5] presented the I -V characteristic of n + -type a-Si 1−x C x :H/p-type c-Si (111) heterostructure diodes at room temperature. a-Si 1−x C x :H films were deposited by plasma-enhanced chemical vapour deposition (PECVD) at 300 • C on 17 cm p-type c-Si.…”
Section: Introductionmentioning
confidence: 99%
“…5 shows the variation of C −2 with V for the solar cells with and without a p-nc-Si:H buffer layer deduced from the C-V measurements at 1 MHz. The frequency of 1 MHz is the same as that adopted by several workers to investigate the hydrogenated amorphous silicon materials using the C-V characteristics [19][20][21]. In Fig.…”
Section: Influence Of P-nc-si:h Buffer Layer On Cell Performancementioning
confidence: 99%
“…The measurement of the capacitance was carried out by means of a computer-controlled HP4192A impedance analyzer at a xed frequency of 1 MHz (ref. [24][25][26] and ac voltage of 10 mV, the ramp rate for the sweeping voltage is about 0.05 V s À1 . The SiNWs solar cells were placed in a closed chamber with electromagnetic shielding to avoid environmental inuence.…”
Section: Methodsmentioning
confidence: 99%