In
this work, the shock sensitivity of hexachlorodisilane (HCDS)
hydrolysis products was studied. The hydrolysis conditions included
vapor and liquid HCDS hydrolysis in moist air. Shock sensitivity was
determined by using a Fall hammer apparatus. Extensive infrared studies
were done for the hydrolysis products. It was found that the Si–Si
bond in HCDS during hydrolysis is preserved and can be cleaved by
shock, leading to intramolecular oxidation of the neighboring silanol
(Si–OH) groups to form a networked Si–O–Si structure
and hydrogen gas. The limiting impact energy for shock sensitivity
was also found proportional to the oxygen/silicon ratio in the deposit.
Finally, recommendations are given for controlling the shock sensitivity
of the hydrolyzed deposit.