Properties of PECVD-deposited thermal barrier coatings

Préauchat, Boris; Drawin, Stefan

doi:10.1016/s0257-8972(01)01211-7

Cited by 47 publications

(16 citation statements)

References 10 publications

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“…The feather-like structure has been commonly observed in YSZ films prepared by EB-PVD 22 and plasmaenhanced CVD PECVD. 23 As described later, more significant feather-like structure was identified in the high-speed deposition of TiO 2 by LCVD. Figure 9b demonstrates the Fig.…”

Section: Results and Discussion 31 Ysz Filmsmentioning

confidence: 66%

High-Speed Deposition of Yttria-Stabilized Zirconia and Titania Films by Laser Chemical Vapor Deposition

禎一

2006

J. Ceram. Soc. Japan

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ɴʀȾʀ CVD ᗕǺȗȚȬɋɐɲȪય‫ك‬ɀɳȻɓȪℋ‫ڽ‬ȂɉɇɓȪℋǽ‫ڢ‬Ɩ۰༔ ቆቧᱧʶ ኇ‫ل‬গકʈୡቦᄦᮾ᳣ཀࢫ980-8577 ͜۞లԂ⊡ٚᢨ౪ 2-1-1Yttria-stabilized zirconia YSZ, Zr 1ࢬx Y x O 2ࢬx2 and titania TiO 2 films were prepared by laser chemical vapor deposition LCVD. The deposition rate increased drastically by laser irradiation, and reached to 660 mmh for YSZ and 2300 mmh for TiO 2 films. The increase of the deposition rate was resulted from plasma formation around the deposition zone, and the plasma was formed at high laser power and high substrate pre-heating temperature. Various morphologies of films such as feather-like columnar structure and dense microstructure were obtained depending on deposition conditions. The columnar structure contained a large amount of nano-pores at columnar boundary and in grains.=Received November 16, 2005?Key-words : Laser chemical vapor deposition, Yttria-stabilized zirconia, Titania, Morphology, Nano-structure 1. Introduction Laser chemical vapor deposition LCVD has been developed to fabricate thin films in semiconductor devise applications.1 LCVD can be categorized into two; one is photolytic LCVD where laser is used as a energy-source for photochemical reactions and the other is pyrolytic LCVD where laser is used as a heat-source for thermal reactions. In photolytic LCVD, ultra-violet laser is often used because the high photon energy of several eV. The chemical reactions for the film deposition would proceed by high energy photon energy even without substrate heating. In pyrolytic LCVD, on the other hand, significantly high deposition rates have been achieved by focusing laser beam. However, the volume deposition rate deposition rate in thickness multiplied by area has been very small ranging around 10 ࢬ12 to 10 ࢬ8 m 3 h ࢬ1 , where thin films, small dots and thin wires have been prepared.2 A CO 2 laser with high power about several 100 W was employed in LCVD to prepare relatively thick materials such as TiN and TiB 2 several 10 mm in thickness.2 However, pyrolytic LCVD using the CO 2 laser has not been widely utilized due to several difficulties such as absorption by window material; ZnSe could be commonly chosen to avoid absorption of an infra-red light.On the other hand, the recent development of laser technology can provide usage of high-power laser with easiness. We have found that many oxide thick films can be prepared at high deposition rates more than several 100 mmh by using LCVD.3,4 This paper focuses on the preparation of yttriastabilized zirconia YSZ and titania TiO 2 films by LCVD using high power Nd:YAG laser.YSZ films have been intensively investigated as thermal barrier coatings TBCs, 5 since YSZ films are chemically stable at high temperatures having a low thermal conductivity and good compatibility with Ni-base superalloy. The thickness of TBCs should be more than several 100 mm, and therefore high-speed deposition processes such as plasma spray 6 and electron-beam physical vapor deposition EB-PVD 7 have been employed. However, heterogeneous microstructures of thermal spray TBCs have often caused delaminati...

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Section: Results and Discussion 31 Ysz Filmsmentioning

confidence: 66%

High-Speed Deposition of Yttria-Stabilized Zirconia and Titania Films by Laser Chemical Vapor Deposition

禎一

2006

J. Ceram. Soc. Japan

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“…This underlines the highly efficient deposition at higher pressure while maintaining vapor deposited structure. The effective deposition rate at 0.67 x 10 5 Pa is roughly estimated to be 195 µm/min after taking account of the substrate holder rotation, which is roughly 40 times larger than the value typically attained by EB-PVD and is smaller only by several times than that by APS (3,20,21) .…”

Section: Pressure Effectmentioning

confidence: 79%

Development of Porous YSZ Coatings with Modified Thermal and Optical Properties by Plasma Spray Physical Vapor Deposition

Kambara

Shinozawa

Aoshika

et al. 2010

JMMP

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“…However, deposition rates of CVD have been usually low typically below 10 mm h 21 , and then many efforts have been made to enhance the deposition rates of CVD for TBCs [13 -19]. Recently, the use of auxiliary energy sources in CVD such as plasma and laser have resulted significant enhancement of deposition rates [16,18,21]. In particular, we have demonstrated that deposition rates have significantly improved to as high as 660 mm h 21 in laser CVD [21].…”

Section: Introductionmentioning

confidence: 91%

“…In particular, we have demonstrated that deposition rates have significantly improved to as high as 660 mm h 21 in laser CVD [21]. YSZ coatings prepared by plasma CVD have exhibited columnar structure and non-transformable tetragonal t 0 phase [18,20]. Therefore, CVD will have more attention in TBCs.…”

Section: Introductionmentioning

confidence: 94%

Thermal barrier coatings produced by chemical vapor deposition

Vargas-Garcı́a

Goto

2003

Science and Technology of Advanced Materials

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Yttria stabilized zirconia (YSZ) can be employed as thermal barrier coatings (TBCs) on Ni-based super alloys in gas turbines and aircraft engines. The YSZ coatings have been fabricated by atmospheric plasma spraying or electron-beam physical vapor deposition. The increase in operation temperature of gas turbines demands another fabrication process to obtain high quality TBCs. Chemical vapor deposition (CVD) can be an alternative route to prepare TBCs due to excellent conformal coverage and columnar microstructure. This paper reviews the fabrication of YSZ films by conventional thermal CVD and plasma CVD intended for TBCs. A new laser CVD developed by our group with a high deposition rate of 660 mm h 21 was also briefly introduced.

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Properties of PECVD-deposited thermal barrier coatings

Cited by 47 publications

References 10 publications

High-Speed Deposition of Yttria-Stabilized Zirconia and Titania Films by Laser Chemical Vapor Deposition

High-Speed Deposition of Yttria-Stabilized Zirconia and Titania Films by Laser Chemical Vapor Deposition

Development of Porous YSZ Coatings with Modified Thermal and Optical Properties by Plasma Spray Physical Vapor Deposition

Thermal barrier coatings produced by chemical vapor deposition

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