1999
DOI: 10.1016/s0040-6090(99)00157-1
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Properties of SiO 2 and Si 3 N 4 layers deposited by MF twin magnetron sputtering using different target materials

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Cited by 12 publications
(4 citation statements)
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“…The ZnO:Al films that were used as front contact layers in this paper were deposited in a vertical inline sputter deposition system (VISS 300) by von Ardenne Anlagentechnik, Dresden, Germany. 3.3 mm thick float glass with a size of 10 × 10 cm 2 (type Eurowhite ®® by Euroglas GmbH, Haldensleben, Germany) was used as substrate upon which a 120 nm SiO x N y thin-film was deposited via reactive sputter deposition [41] using a Sispa™ target [42,43]. The SiO x N y -layer served as antireflection coating between the glass and the ZnO:Al and as barrier layer to prevent sodium diffusion from the substrate glass to the zinc oxide interface.…”
Section: Zno:al Front Contactsmentioning
confidence: 99%
“…The ZnO:Al films that were used as front contact layers in this paper were deposited in a vertical inline sputter deposition system (VISS 300) by von Ardenne Anlagentechnik, Dresden, Germany. 3.3 mm thick float glass with a size of 10 × 10 cm 2 (type Eurowhite ®® by Euroglas GmbH, Haldensleben, Germany) was used as substrate upon which a 120 nm SiO x N y thin-film was deposited via reactive sputter deposition [41] using a Sispa™ target [42,43]. The SiO x N y -layer served as antireflection coating between the glass and the ZnO:Al and as barrier layer to prevent sodium diffusion from the substrate glass to the zinc oxide interface.…”
Section: Zno:al Front Contactsmentioning
confidence: 99%
“…1,2 Normally, SiO 2 is obtained from mineral sources such as quartzite, but it has been recently found that SiO 2 can also be obtained from bionatural resources such as rice hulls. Normal rice hulls are composed of approximately 80 wt.…”
Section: Introductionmentioning
confidence: 99%
“…O índice de refração de 1,462 (relativo ao SiO 2 ) foi fixado no cálculo da espessura das amostras controles, visto que estes dielétricos são filmes baseados em óxido de silício. Para a obtenção das espessuras das amostras controles da oxinitretação e nitretação, foi usado também o valor do índice de refração do nitreto de silício (Si 3 N 4 ), que apresenta o valor 2,0[21]. No caso dos filmes de Ti, foram utilizados três valores de índices de Devido às dificuldades de se medir filmes com espessuras menores que 10 nm (como já foi citado acima), os valores obtidos encontram-se dentro de um erro de ± 100%.…”
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