No abstract

No abstract

Summary Current and upcoming specifications for optical filters and components are driving the demand for optimized deposition techniques. Besides the need for high precision process control to achieve accurate and reproducible layer properties, additional requirements from a process automation perspective have to be considered. In particular, applications in the semiconductor industry require reliable, accurate substrate handling to microelectronic standards. The Helios 800 sputtering system provides extremely accurate layer depositon and thickness control, allowing manufacture of state of the art optical components with high throughput. These include beamsplitters, band pass, edge, and multinotch dielectric filters. In addition optoelectronic applications, which combine electronic components with optical filters, are growing rapidly.

No abstract

No abstract