High precision optical filter based on magnetron sputtering

Abstract

Summary Current and upcoming specifications for optical filters and components are driving the demand for optimized deposition techniques. Besides the need for high precision process control to achieve accurate and reproducible layer properties, additional requirements from a process automation perspective have to be considered. In particular, applications in the semiconductor industry require reliable, accurate substrate handling to microelectronic standards. The Helios 800 sputtering system provides extremely accurate layer depositon and thickness control, allowing manufacture of state of the art optical components with high throughput. These include beamsplitters, band pass, edge, and multinotch dielectric filters. In addition optoelectronic applications, which combine electronic components with optical filters, are growing rapidly.

CuxCo3-xO4 ultra-thin film as efficient anodic catalysts for anion exchange membrane water electrolysers

“…This ion bombardment induces the ejection of material from the target onto a substrate located nearby. MS deposition gives rise to homogeneous films of controlled low metal loading and thickness, operates at room temperature, and it is easily scalable and quite reproducible [15][16][17][18][19]. The compactness of the deposited material with this technique can be tuned through deposition geometry, i.e., angle between the flux of sputtered particles from the target and substrate normal [19].…”