2016 31st Symposium on Microelectronics Technology and Devices (SBMicro) 2016
DOI: 10.1109/sbmicro.2016.7731357
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Proton radiation influence on SOI FinFET trade-off between transistor efficiency and unit gain frequency

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Cited by 2 publications
(3 citation statements)
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“…Regarding the proton irradiation, it is noticeable that the SS of the devices is affected, as already suggested in previous works [5,17]. For wider n-FinFETs, a degradation of the SS after irradiation is verified, suggesting that the positive charges in the buried oxide induced by the proton irradiation promote an increase of the back interface current, because of the decrease in the threshold voltage at the back interface (V th2 ).…”
Section: Experimental Device Modelingsupporting
confidence: 67%
See 1 more Smart Citation
“…Regarding the proton irradiation, it is noticeable that the SS of the devices is affected, as already suggested in previous works [5,17]. For wider n-FinFETs, a degradation of the SS after irradiation is verified, suggesting that the positive charges in the buried oxide induced by the proton irradiation promote an increase of the back interface current, because of the decrease in the threshold voltage at the back interface (V th2 ).…”
Section: Experimental Device Modelingsupporting
confidence: 67%
“…No bias was applied during the irradiation and all the devices were unpackaged. Other studies that used the same irradiated devices can be found in [5,15,17]. The measurements for this study were performed at room temperature, using the Keysight Agilent B1500A semiconductor device analyzer at University of Sao Paulo (LSI/USP).…”
Section: Device Characteristicsmentioning
confidence: 99%
“…It is known that the SOI technology provides significant immunity to single-event phenomena when compared to bulk transistors, due to the thin active silicon region that provides a better electrostatic coupling and the existence of the buried oxide beneath the channel that isolates the transistor active area from the substrate. Still, the radiation effect have to be considered because the trapped charges in the buried oxide (BOX) degrade the transistor characteristics due to the higher Total Ionization Dose (TID) (5)(6)(7)(8)(9).…”
Section: Introductionmentioning
confidence: 99%