Proximity-effect correction for 3D single-photon optical lithography

Wan, Xiaowen; Menon, Rajesh

doi:10.1364/ao.55.0000a1

Cited by 7 publications

(2 citation statements)

References 19 publications

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“…When simultaneously exposing several spots, this effect is exacerbated and different local TPP thresholds are observed, for example, at the center and in the corner of a write spot array. This effect is attributed to diffusion phenomena [15,16,20,21] and has already been observed for conventional single photon polymerization [22] as well as in DLW, both with low one-photon absorption (LOPA) [23] and two-photon absorption [15,16]. It has even been already taken advantage of to improve surface smoothness [24].…”

Section: Introductionmentioning

confidence: 73%

“…It has even been already taken advantage of to improve surface smoothness [24]. Although it has occasionally been highlighted in articles dealing with DLW, proposing tracks to correct it mainly with dynamic irradiation power control [15,16,22,23,[25][26][27], its precise and quantitative characterization is scarce and has, to our knowledge, never been reported in detail for parallel plotting. It has also recently been identified as a key difficulty that must be overcome to enable significant parallelization speed improvements through the use of large numbers of closely spaced write spots [13].…”

Section: Introductionmentioning

confidence: 99%

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Understanding and overcoming proximity effects in multi-spot two-photon direct laser writing

Arnoux

Pérez-Covarrubias²,

Khaldi³

et al. 2022

Additive Manufacturing

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Although additive manufacturing using multi-photon direct laser writing is nowadays considered as a major tool in the fabrication of future nano/micro-objects and optical components, it is currently limited by the low throughput of the writing process. To circumvent this issue, massive parallelization of the write process is a very promising avenue. However, simultaneous writing of structures in close spatial proximity generates fabrication artefacts, collectively referred to as "proximity effects", which strongly limit the accessible structure resolution. In this work, we systematically investigate the experimental parameters that influence these effects using specifically designed N×N spot diffractive optical elements. Through computer simulations, we show that these effects can be modeled remarkably successfully simply by taking Point Spread Function overlap and diffusion processes into account. We illustrate the usefulness of the concept by designing a parallel write approach giving access to periodic structures with short inter-object distances while very largely overcoming proximity effects.

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