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Within this work, we present an approach to use UV-enhanced substrate conformal imprint lithography (UV-SCIL) as a soft imprint technique combined with excimer laser irradiation to manufacture Bragg gratings within planar waveguides on a full wafer scale. For the first time, different hybrid polymers (OrmoComp®, OrmoStamp, OrmoCore, OrmoClad and OrmoClear) could be successfully patterned using UV-SCIL. For OrmoComp® (showing results very similar to OrmoStamp and OrmoClad) a complete imprint process could be realized. OrmoCore formed an inhibition layer in the presence of oxygen during the imprint, as could be observed for the use of OrmoClear as well. Processing options were elaborated to reduce the inhibition effect significantly, whereby the latter is mainly due to the atmospheric oxygen containing PDMS layer of the UV-SCIL working stamp. Further on, the successful realization of a planar Bragg grating operating at the telecom wavelength is demonstrated by tuning the refractive index (RI) of OrmoComp® using a phase mask and an UV excimer laser. FTIR-measurements show that the change in refractive index can be clearly correlated with a change in the chemical composition of the hybrid polymer during laser exposure

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This work presents the large area fabrication of plasmonic colour filters consisting of subwavelength apertures in aluminium films of different thicknesses. Wafer-scale pattern transfer was realized by a soft lithography technique (substrate conformal imprint lithography). The fabricated colour filters have an active area of up to 145 cm2 which presents a considerable increase compared to previously published results. In addition to experimental investigations, simulations of the transmission behaviour were performed using a rigorous electromagnetic field solver based on an extended RCWA approach. Furthermore, the use of a spin-coated cover layer consisting of the UV-curable hybrid polymer OrmoComp® instead of often applied PECVD-SiO2 was investigated.