Large area manufacturing of plasmonic colour filters using substrate conformal imprint lithography

Rumler, Maximilian; Foerthner, M; Baier, L.; Evanschitzky, Peter; Becker, Marco; Frey, L.

doi:10.1088/2399-1984/aa6560

Cited by 5 publications

(6 citation statements)

References 47 publications

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“…These modes are caused by excitation of surface plasmon polaritons (SPP) on the silver-dielectric interfaces, which could lead to higher absorption. The coupling condition of light to SPPs for normal incidence is dependent on the material properties of the metal and the dielectrics, the layer thicknesses as well as on the unit cell size and the polarization state of the light [5]. The transmission through the nanomesh in figure 7(a) shows a clear difference for polarization-dependent excitation, as is expected, due to the different unit cell and feature size in the x-and y-direction.…”

Section: Metal Nanomesh Fabrication and Characterizationmentioning

confidence: 71%

“…Using NIL, the fabrication of devices, in which a high accuracy of the nanopattern is mandatory, has already been successfully demonstrated e.g. for transparent conductive metal nanomeshes [1,3], wire grid polarizers [4], color filters [5], NIR Fabry-Pérot filter arrays [6], surface plasmon resonance sensors [7,8], and optoelectronic devices [9][10][11]. For metal nanomesh fabrication, a socalled bi-layer lift-off process is preferentially used to realize metal nanostructures without the need of a direct metal etching.…”

Section: Introductionmentioning

confidence: 99%

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Development of a soft UV-NIL step&repeat and lift-off process chain for high speed metal nanomesh fabrication

et al. 2020

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In this work, we present a fabrication procedure of metal nanomesh arrays with the newly developed nanoimprint resist mr-NIL212FC used in a bi-layer resist system for a lift-off process. We comparatively analyzed and evaluated nanomeshes fabricated with a freshly prepared h-PDMS/PDMS stamp and a stamp used 501 times. Therefore, we first performed a step&repeat imprint test run in a self-built low cost step&repeat UV-NIL setup. We inspected the imprint behavior of the stamp, the UV-transmission through the stamp as well as stamp lifetime and stamp degradation with regard to the possible changes of its surface roughness. The nanomesh fabrication process is characterized by a good lift-off performance, leading to a low defect density of <1.26 defects 100 µm−2. Even after 501 imprints, only a negligible stamp degradation occurred without effecting the imprint performance. Likewise, the same holds true for the nanomeshes, which showed comparable low defect densities and feature sheet resistances of 3.54 ± 0.14 Ω/□ for the first and 3.48 ± 0.23 Ω/□ for the 501st nanomesh, respectively. AFM analyses further revealed that the maximum height of the roughness Rt changed over the course of the 501 imprints from 6.3 nm to 13.3 nm, representing <5% of the overall imprint height. In general, the mr-NIL212FC resist shows a good wettability and compatibility with standard h-PDMS/PDMS stamps, a fast curing behavior, a high replication fidelity, easy separation characteristics, and a very low diffusion of resist components into the stamp. The mr-NIL212FC resist allows exposure times as short as 2 s in the applied tool setup, enabling high throughput production. Moreover, all performed measurements indicate that a much higher number of imprints with one stamp seem possible.

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Section: Metal Nanomesh Fabrication and Characterizationmentioning

confidence: 71%

Section: Introductionmentioning

confidence: 99%

Development of a soft UV-NIL step&repeat and lift-off process chain for high speed metal nanomesh fabrication

et al. 2020

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“…The fabrication process proposed in this study is low cost and can produce a vertical nanogap of 10 nm in a large area. [38][39][40] The sensing capability of the MA with a vertical nanogap was experimentally verified using monolayer (2.8 nm thickness) molecules of 1-octadecanethiol (ODT), which is frequently used as an analyte molecule to assess the sensing capability of Au SEIRA platform, [10,13,14,[41][42][43][44][45][46] and a record-high reflection difference SEIRA signal of 36% was obtained.…”

Section: Introductionmentioning

confidence: 99%

Ultrasensitive Molecule Detection Based on Infrared Metamaterial Absorber with Vertical Nanogap

Hwang

Kim

et al. 2021

Small Methods

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identification. However, because fingerprint vibrations of molecules in the mid-IR range intrinsically have low-absorption cross sections, a large quantity of the sample is required for detection and identification. [2] Therefore, the use of conventional IR absorption spectroscopy based on the Beer-Lambert law is limited when the analysis of a small quantity of analyte, such as a monolayer, is required. Surfaceenhanced IR absorption (SEIRA) spectroscopy was proposed as a method to mitigate this limitation. In this method, the fingerprint vibration of analyte molecules is amplified through coupling with highly enhanced and confined electromagnetic near-fields induced in engineered surfaces or structures. [3][4][5][6][7] After the first experimental demonstration of SEIRA based on resonant coupling using plasmonic nanorods, various types of plasmonic or dielectric resonator structures for SEIRA studies in the mid-IR range were reported, such as split-ring resonators, [8] fan-shaped nanoantennas, [9] nanoslits, [10,11] nanoantennas on pedestals, [12][13][14][15] co-axial resonators, [16][17][18] elliptical dielectric nanoresonators, [19,20] and metamaterial absorbers (MAs). [14,[21][22][23][24][25][26][27] In recent studies, it was reported that these SEIRA structures can be used to detect biomolecules such as protein A/G and immunoglobulin G (IgG) antibody, [12] bovine serum albumin, [23] and hemoglobin. [28] Because most resonant SEIRA structures use near-field enhancement induced in the in-plane nanometer-sized gap, high-precision fabrication equipment is required, such as e-beam lithography; thus, large-area patterning is limited and costly. Recently, a promising SEIRA study was proposed using the bound states in the continuum (BIC) phenomenon of dielectric resonators with high quality (Q) factors; [19,20] however, this approach also has limitations regarding the fabrication and analysis of multiple pattern arrays using a costly high-precision fabrication process.Among the various proposed structural platforms, MAs have also demonstrated remarkable SEIRA signal enhancement. MAs composed of metal-insulator-metal configuration are generally designed with a dielectric spacer layer sandwiched between an optically thick metallic back plane and a structured metallic top nanoantenna, where totally suppressed light transmission and reflection can be achieved in an optimized structure, which leads to perfect absorption at a specific wavelength. [29][30][31][32] In this optimized MA, a well-confined and highly enhanced electromagnetic near-field in the vicinity of the top nanoantenna and the bottom back plane is induced via the Surface-enhanced infrared absorption (SEIRA) spectroscopy is a powerful methodology for sensing and identifying small quantities of analyte molecules via coupling between molecular vibrations and an enhanced near-field induced in engineered structures. A metamaterial absorber (MA) is proposed as an efficient SEIRA platform; however, its efficiency is limited because it requires the appropriate insu...

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“…To address these issues, we employed UV-curable inorganicorganic hybrid polymers as they show little discoloration and high weather resistance. 22) However, this type of polymer has high viscosity, which makes it difficult to fabricate the ARS with a uniform height and thin residual layer. Therefore, we controlled the fabrication process using this polymer via spincoating and thus prepared an ARS on an aspherical lens using the hybrid polymer.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of an antireflection structure on an aspherical lens using a UV-curable inorganic–organic hybrid polymer

Mano¹,

Taniguchi²

2019

Jpn. J. Appl. Phys.

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The reflection of light from the surface of a lens leads to image deterioration. To prevent this, an antireflection coating is usually used. Although this cannot prevent reflection from a wide range of wavelengths and angles of incidence this can be overcome by using an antireflection structure (ARS). Previously, we fabricated an ARS on an aspherical lens using a reverse-type replica mold with a UV-curable resin. However, the conventional UV-curable resin is weak against heat and climate; consequently, deterioration with aging in the form of yellowing and cracks occurs. A UV-curable inorganic-organic hybrid polymer can overcome this limitation, as it shows little discoloration and high weather resistance. It is difficult to fabricate an ARS with a thin residual layer because the polymer has high viscosity. Herein, this polymer was heated to reduce its viscosity and spin-coated to reduce the residual layer. Thus, we successfully fabricated an ARS with a uniform height of more than 240 nm and a thin residual layer of less than 150 nm in all parts. Moreover, the ARS fabricated with the hybrid polymer did not break after a heat resistance test (100 °C for 4 h); hence, it has high weather resistance.

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Large area manufacturing of plasmonic colour filters using substrate conformal imprint lithography

Cited by 5 publications

References 47 publications

Development of a soft UV-NIL step&repeat and lift-off process chain for high speed metal nanomesh fabrication

Development of a soft UV-NIL step&repeat and lift-off process chain for high speed metal nanomesh fabrication

Ultrasensitive Molecule Detection Based on Infrared Metamaterial Absorber with Vertical Nanogap

Fabrication of an antireflection structure on an aspherical lens using a UV-curable inorganic–organic hybrid polymer

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