Proximity effect correction using blur map in electron projection lithography

Yamashita, Hiroshi; Yamamoto, Jiro; Koba, Fumihiro; Arimoto, Hiroshi

doi:10.1116/1.2101791

Cited by 3 publications

(2 citation statements)

References 8 publications

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“…In general, increasing beam current density will degrade beam resolution due to the Coulomb interaction effects. 30,[52][53][54][55][56] This will be addressed by optimizing the electron optical parameters that affect the effects. Optimizing writing strategy including the PLDC, which is related with M s and B b , is also a key element.…”

Section: Future Of Mbm Seriesmentioning

confidence: 99%

Recent progress and future of electron multi-beam mask writer

Yasuda¹,

Nomura²,

Matsumoto³

et al. 2023

Jpn. J. Appl. Phys.

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In this paper, development of NuFlare Technology’s multi-beam (MB) mask writing system MBM-2000 series is reviewed, and future plans for the MBM series are discussed. The MB mask writing systems were designed on the basis of unique concepts suitable for high-volume production of leading-edge masks, i.e., high beam current density, a reliable beam blanking aperture array (BAA) system with a 50-keV single-stage acceleration optics, high-speed inline pixel-level dose correction, and a distinctive hardware system for charging effect reduction. The latest MB mask writing system, MBM-2000PLUS, achieves a high throughput of 8.7 hours in a 104×130 mm2 writing area for a 150 μC/cm2 resist thanks to a high beam current density of 3.2 A/cm2. In addition, a global position accuracy of 1.2 nm, a local position accuracy of 0.5 nm, and a local critical dimension uniformity of 0.61 nm are achieved. The BAA system has shown long-term stable operation for more than one year. The high productivity and writing accuracy realized by NuFlare Technology’s concepts will contribute to further miniaturization of semiconductors.

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Section: Future Of Mbm Seriesmentioning

confidence: 99%

Recent progress and future of electron multi-beam mask writer

Yasuda¹,

Nomura²,

Matsumoto³

et al. 2023

Jpn. J. Appl. Phys.

Self Cite

View full text Add to dashboard Cite

show abstract

“…With increased beam current density, we need to cope with the Coulomb interaction effects [6][7][8][9][10][11] . They degrade beam resolution due to repulsion of electrons, and the degradation becomes more prominent as the total beam current increases.…”

Section: System Designmentioning

confidence: 99%