Publisher's Note: “Collapse of the low temperature insulating state in Cr-doped V2O3 thin films” [Appl. Phys. Lett. 107, 111904 (2015)]

Visible and Infrared Photoresponse in (V0.99Cr0.01)2O3 Epitaxial Films

“…As a type of multifunctional material, vanadium oxides (V x O y ) have received considerable interest in many fields of modern science, such as electric field adjusting in electronic devices [1][2][3] and electrodes in lithium-ion batteries, [4] solar cells, [5][6][7][8][9] and sewage treatment systems, [7,10] mainly due to their good optical, electrical, and magnetic properties. These properties are highly dependent on crystallographic structure, crystal field splitting, and hybridization between O 2 p and V 3 d bands.…”

Metal–Insulator Transitions in Stable V2O3 Thin Films: Atomic Layer Deposition and Postdeposition Annealing Studies

“…[15] It was reported that the suppression of MIT in Cr-doped V 2 O 3 thin films deposited on Al 2 O 3 [0001] substrates was due to Cr elevating excess oxygen in the films by retaining the metallic state. [16] Atomic layer deposition (ALD) is considered as one of the unique thin film deposition techniques because of its versatile features compared with other conventional techniques such as chemical vapor deposition (CVD) and physical vapor deposition (PVD). [17][18][19] Advantages of ALD include controlling film thickness at the atomic scale, uniformity and conformality of the thin films with high aspect ratio, and reproducibility.…”