Pulsed Laser Ablation of Solids

Stafe, Mihai; Marcu, Aurelian; Puscas, Niculae N.

doi:10.1007/978-3-642-40978-3

Cited by 89 publications

(85 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…However, one of its problems is the high directionality of the ejected particles, which leads to an inhomogeneous density of the layer. This deposition, in the case of the PLD technique, follows a distribution with the form of cos n θ, where θ is the angle between the direction of the ejected particles and the normal to the surface of the target, and n is a number depending on the conditions of the experiment, which can achieve values higher than 30 [20]. To solve this, inconvenient small area of the target (28 Â 2 mm) were scanned with the laser beam instead of focussing it in a fixed point.…”

Section: Resultsmentioning

confidence: 99%

“…Third, the use of a pulse laser enables a very precise control over the growth rate. Besides, due to the fact that this technique does not include impurities from the holder or the environment, it is a very clean technique [20]. And finally, the high kinetic energy of the ejected particles in comparison with other methods leads to an increase in the density of the layer and its adherence to the substrate [21].…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Fabrication of a Cell Electrostimulator Using Pulse Laser Deposition and Laser Selective Thin Film Removal

Beloso¹,

Varela²,

Rodríguez³

et al. 2017

Laser Ablation - From Fundamentals to Applications

View full text Add to dashboard Cite

In this work, we present a laser-based process for fabricating a cell electrostimulator. The fabrication methodology comprises two laser processes: a pulse laser deposition (PLD) of an aluminum thin film on soda-lime glass and a laser-based selectively removal of the thin film. The laser set-up for PLD consist of Nd:YVO 4 Rofin Power line 20E (1064 nm wavelength, 20 ns pulse width) focused by a lens of 160 mm focal length inside a vacuum chamber to strike a target of the deposited material. The same laser is used for selectively removing the thin film but focused by a lens of 100 mm focal length. The geometry design is made in CAD-like software. Before microfabrication, a thin aluminum layer (1 μm thickness) is deposited on soda-lime glass using the PLD method. In order to assemble the device, the electrical stimulator is placed between two polycarbonate sheets of 1.5 mm thickness. To prevent any contact with the electric circuit, a thin silicate glass (100 μm) is placed over the electrostimulator. Simulations were performed using ANSYS Maxwell software, verifying that the induced electrical field achieves the minimum for cell stimulation.

show abstract

Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Fabrication of a Cell Electrostimulator Using Pulse Laser Deposition and Laser Selective Thin Film Removal

Beloso¹,

Varela²,

Rodríguez³

et al. 2017

Laser Ablation - From Fundamentals to Applications

View full text Add to dashboard Cite

show abstract

“…Under conditions of low energy deposition rates such as the ones found in nanosecond laser pulses, melting initiates heterogeneously from surfaces and crystal defects [29], and the extent of the heat a↵ected zone can be estimated by the heat di↵usion length into the material [30][31][32], which depends on its thermal di↵usivity and the laser pulse duration. This would yield a heat-a↵ected region of approximately 510 nm per pulse for nickel [33,34], however the total extent of the heat a↵ected region varies because it also depends on the number of pulses and the type of heat conduction [35].…”

Section: Discussionmentioning

confidence: 99%

Induced hydrophobicity in micro‐ and nanostructured nickel thin films obtained by ultraviolet pulsed laser treatment

Carpeño

Dickinson

Seal

et al. 2016

Physica Status Solidi (a)

View full text Add to dashboard Cite

Abstractauthoren Nickel thin films were deposited on Ti6Al4V and surface treated with nanosecond pulse ultraviolet laser in ambient conditions using a fluence of 3.68 J cm−2. A twofold to threefold increase in contact angle was observed for water, ethylene glycol, and diiodomethane following laser treatment, with recorded contact angles for water in excess of 130°. No additional treatment was used to hydrophobize the surface. Three different micro‐ and nanometric levels of roughness were generated on the thin film surface, which can be related to the rastering parameters of the laser and to the increase in apparent contact angle. Melt droplets were identified as a main contribution to the nanometric roughness level, indicating that melting and melt ejection play an important role in surface nanostructuring. Micro‐ and nanopatterning obtained after UV laser treatment of nickel thin films, highlighting the different scales of the generated features.

show abstract

“…This technique has several advantages with respect to molecular beam epitaxy, among which are the high versatility, applicability and possibility to perform stoichiometric transfer, even with complicated compounds. 2,3 For applications of the PLD technique, it is important to understand the physical principles that govern the growth process. Recent studies performed with Ge have yielded results about the roughness evolution, parameter dependence of the epitaxial breakdown and coarsening of mound-like structures on the surface.…”

Section: Introductionmentioning

confidence: 99%

Topography evolution of germanium thin films synthesized by pulsed laser deposition

2017

View full text Add to dashboard Cite

Germanium thin films were deposited by Pulsed Laser Deposition (PLD) onto single crystal Ge (100) and Si (100) substrates with a native oxide film on the surface. The topography of the surface was investigated by Atomic Force Microscopy (AFM) to evaluate the scaling behavior of the surface roughness of amorphous and polycrystalline Ge films grown on substrates with different roughnesses. Roughness evolution was interpreted within the framework of stochastic rate equations for thin film growth. Here the Kardar-Parisi-Zhang equation was used to describe the smoothening process. Additionally, a roughening regime was observed in which 3-dimensional growth occurred. Diffusion of the deposited Ge adatoms controlled the growth of the amorphous Ge thin films. The growth of polycrystalline thin Ge films was dominated by diffusion processes only in the initial stage of the growth.

show abstract

Pulsed Laser Ablation of Solids

Cited by 89 publications

References 0 publications

Fabrication of a Cell Electrostimulator Using Pulse Laser Deposition and Laser Selective Thin Film Removal

Fabrication of a Cell Electrostimulator Using Pulse Laser Deposition and Laser Selective Thin Film Removal

Induced hydrophobicity in micro‐ and nanostructured nickel thin films obtained by ultraviolet pulsed laser treatment

Topography evolution of germanium thin films synthesized by pulsed laser deposition

Contact Info

Product

Resources

About