Pulsed Plasma Polymerization of Perfluorocyclohexane

Abstract

Pulsed versus continuous wave plasma polymerization of perfluorocyclohexane is compared as a function of duty cycle off-time, on-time, and peak power. The chemical composition of the deposited films has been determined by X-ray photoelectron spectroscopy (XPS). A greater retention of the chemical structure associated with the precursor molecule is found for the pulsed plasma polymerization experiments. This can be rationalized in terms of the relative perturbation of reactive species contained in the electrical discharge.

Deposition mechanism of nanostructured thin films from tetrafluoroethylene glow discharges

“…Briefly, the same recombination products were detected, with similar trends as well. Moreover, the semi-quantitative analysis revealed that, for each product, the partial pressure at one input power of the continuous discharge is almost the same as that obtained in modulated plasmas at the corresponding average input power, which can be calculated as the DC times the peak power [50,51]. This last result can be explained by the fact that FT-IRAS is not a time-resolved technique.…”

Chemical‐surface modification of polymers using atmospheric pressure nonequilibrium plasmas and comparisons with vacuum plasmas

“…Surface modification of polymers by vacuum nonequilibrium plasmas is well documented in the scientific literature. Examples of vacuum‐plasma chemical‐surface modification8, 13, 14 and physical‐surface modification15–17 plasma‐assisted chemical‐vapor deposition18–21 and surface‐property enhancement (e.g., adhesion improvement22–25) are prevalent. However, examples of polymer‐surface modification at atmospheric pressure with nonequilibrium plasmas are much rarer.…”

The growth and chemical structure of thin photonic films formed from plasma copolymerization. Part II. Effect of monomer feed location

“…Activated fluorine species are created by the decomposition of OFCB through collision-induced reactions including electron impact dissociation, ion bombardment, and collision with argon metastable species, in addition to radiation-induced reactions including unimolecular excitation and dissociation [13,33,34]. As discussed above, the high reactivity of benzene molecules seriously affects the initiation of the fluorine species when introduced in the DS region, leading to a significant decrease in the quantity of activated fluorine species available for copolymerization.…”