Pulsed Regime of a Hollow-Cathode Discharge Used in a Sputter Source

Abstract

The pulsed operation of a cavity hollow-cathode post-discharge sputtering source was proposed to facilitate the sputtering of low-conductivity materials. Self-oscillating and externally driven pulsed regimes were investigated. The plasma density, temperature and relative density of atomic species along the discharge axis were determined by optical emission spectroscopy and Langmuir probe diagnostics. The temporal evolution of these parameters and dynamic current–voltage characteristics of the discharge were recorded in both regimes as functions of gas pressure and discharge current. The results bring more insight into the utilization of the above-mentioned device as a small sputtering source.

Cavity-hollow cathode-sputtering source for titanium films

“…The upper disk is 7 mm high (4) and has a conical upward widening muzzle (11). The two disks are separated by a glass spacer (15 mm in diameter and 7 mm in height) (8), for optical measurements [18,20]. Disks and glass spacer confine a 1.25 cm 3 cathode chamber (3).…”

“…The CHC was used to grow good quality thin films of TiN x O y , TiN, Ni and Fe [16][17][18][19]. The configuration was intensively investigated in dc and pulsed regimes [18,20]. The film quality was enhanced by intense bombardment of the substrate by electrons.…”