Quantitative analysis of CD degradation induced by the fogging effect in e-beam lithography

Chang, Shau-Feng; Wang, Tzu-Yi; Lien, Ta-Cheng; Chen, Chia-Jen; Lin, Chih-Cheng; Lee, Sin-Chang; Yen, Anthony

doi:10.1117/12.2197838

Cited by 3 publications

(1 citation statement)

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“…To limit the effects on groove structure from extended KOH etching, a higher ratio of exposed:unexposed area was pursued during e-beam exposure. When the ratio of exposed:unexposed grating regions grows too large, e-beam fogging can affect the resist, modifying the ultimate size of the groove features after development and degrading the fidelity of the residual resist [16]. To both minimize the over-etching effects from the KOH exposure and avoid resist fogging, an exposed:unexposed ratio of ∼6:1 was used along with a controlled KOH etch, resulting in ∼1.5 𝜇m Si plateaus at the apex of each groove in the 11.2 𝜇m groove period.…”

Section: Echelle Fabricationmentioning

confidence: 99%

High Efficiency Echelle Gratings for the Far Ultraviolet

Kruczek¹,

Miles²,

Fleming³

et al. 2022

Preprint

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Modern grating manufacturing techniques suffer from inherent issues that limit their peak efficiencies. The anisotropic etching of silicon facilitates the creation of custom gratings that have sharp and atomically smooth facets, directly addressing these issues. We describe work to fabricate and characterize etched silicon echelles optimized for the far ultraviolet (FUV; 90 -180 nm) bandpass. We fabricate two echelles that have similar parameters to the mechanically ruled grating flown on the CHESS sounding rocket. We demonstrate a 42% increase in peak order efficiency and an 83% decrease in interorder scatter using these gratings. We also present analysis on where the remaining efficiency resides. These demonstrated FUV echelle improvements benefit the faint source sensitivity and high-resolution performance of future UV observatories.

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Section: Echelle Fabricationmentioning

confidence: 99%

High Efficiency Echelle Gratings for the Far Ultraviolet

Kruczek¹,

Miles²,

Fleming³

et al. 2022

Preprint

View full text Add to dashboard Cite

show abstract

Reinforcement-Learning-Based Foggy-Aware Optimal Placement Method for Analog and MixedSignal Circuits

Sadrafshari,

Dobre,

Zhang

2024

2024 IEEE International Symposium on Circuits and Systems (ISCAS)

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High efficiency echelle gratings for the far ultraviolet

et al. 2022

View full text Add to dashboard Cite

Modern grating manufacturing techniques suffer from inherent issues that limit their peak efficiencies. The anisotropic etching of silicon facilitates the creation of custom gratings that have sharp and atomically smooth facets, directly addressing these issues. We describe work to fabricate and characterize etched silicon echelles optimized for the far ultraviolet (FUV; 90–180 nm) bandpass. We fabricate two echelles that have parameters similar to the mechanically ruled grating flown on the Colorado High-resolution Echelle Stellar Spectrograph sounding rocket. We demonstrate a 42% increase in peak order efficiency and an 83% decrease in interorder scatter using these gratings. We also present analysis on where the remaining efficiency resides. These demonstrated FUV echelle improvements benefit the faint source sensitivity and high resolution performance of future UV observatories.

show abstract

Quantitative analysis of CD degradation induced by the fogging effect in e-beam lithography

Cited by 3 publications

References 1 publication

High Efficiency Echelle Gratings for the Far Ultraviolet

High Efficiency Echelle Gratings for the Far Ultraviolet

Reinforcement-Learning-Based Foggy-Aware Optimal Placement Method for Analog and MixedSignal Circuits

High efficiency echelle gratings for the far ultraviolet

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