Quantitative Optical Microscopy at the Nanoscale: New Developments and Comparisons

Dimensional artefacts to achieve metrological traceability in advanced manufacturing

“…Using different measurement methods -e.g. atomic force microscopy (AFM), scanning electron microscopy (SEM), optical microscopy (OM) and scatterometry -in the traceability chain of bidirectional measurands, thus, requires appropriate signal modelling of the respective edge contrasts of the different instruments, based on physical simulations of the interaction of the sample with the measuring probe, to allow the dissemination of the bidirectional measurands with appropriate uncertainty [33], [63], [128]. The quality of the feature to be measured limits the achievable measurement uncertainty (see Figure 5).…”

Applications of super-resolution imaging in the field of surface topography measurement

“…Zontak and Cohen 2009) or SPMs, and their limitations were discussed in section 1. Ultra-violet microscopes have also been developed, mainly for critical dimension measurement, but also suffer from slow speeds and relatively small fields of view (Bodermann et al 2012).…”

Advanced finite-element methods for design and analysis of nanooptical structures: applications

“…94,[97][98][99][100][101][102][103][104][105][106][107][108] The FEM implementation is also used by national metrology institutes (PTB, NIST) for critical dimension metrology and other purposes. 99,101,105,109…”