Quantitative simulation of contrast of support films in high resolution electron microscopy

Kanaya, K.; Ono, Susumu; Hojou, K.; Oikawa, Tetsuo

doi:10.1016/0047-7206(79)90003-7

Cited by 3 publications

(1 citation statement)

References 15 publications

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“…From the thickness ratio of deposition to d(nm) = KIt (mA. min) removal, from (9) and (121, it follows that 2 where the scaling factor f(0) depending on = 98 ( 2 ) ( X) f(e) (13) the angular distribution of sputtered atoms is determined from the measurement by a which is available with either the deposition thickness meter for the ion-beam dose mea-thickness estimation or the removal thicksured by Faraday cup, and the film density ness estimation, where r = 0.2-0.5 cm was ~2 relates with the solid target density given wed. by P2F k 0.72~2 (Kanaya et a]., 1979(Kanaya et a]., ,1983a. Figure 6 shows the measurement of the sputtering deposition thickness rate K for Af with 5 keV and 10 keV, and the fixed incident angle d4.…”

Section: Sputtering Removal and Deposition Thickness Ratementioning

confidence: 99%

Application of ion beam sputtering for high‐resolution electron microscopy

Kanaya

Baba

Muranaka

et al. 1986

J. Elec. Microsc. Tech.

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Ion beam sputtering for high-resolution electron microscopy has basically provided miscellaneous operational features such as atomic shadowing, uncoated observation, and etching of biological specimens coupled with tungsten sputter coating and thinning of solid materials.Based on the power-potential law of Lindhard for ionic impact phenomena on metal surfaces, the universal yield-energy relationship has been derived. Thereby the sputtering deposition rate with reference to the sputtering removal rate was obtained as a function of sputtering yield, and the most important angular distribution of sputtering yield could be measured by using the hemicylindrical specimen stage.Evidence is presented to show that ion beam sputtering has become one of the most powerful tools for high-resolution electron microscopy.

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Section: Sputtering Removal and Deposition Thickness Ratementioning

confidence: 99%