Memristive devices relying on redox-based resistive switching
mechanisms
represent promising candidates for the development of novel computing
paradigms beyond von Neumann architecture. Recent advancements in
understanding physicochemical phenomena underlying resistive switching
have shed new light on the importance of an appropriate selection
of material properties required to optimize the performance of devices.
However, despite great attention has been devoted to unveiling the
role of doping concentration, impurity type, adsorbed moisture, and
catalytic activity at the interfaces, specific studies concerning
the effect of the counter electrode in regulating the electronic flow
in memristive cells are scarce. In this work, the influence of the
metal–insulator Schottky interfaces in electrochemical metallization
memory (ECM) memristive cell model systems based on single-crystalline
ZnO nanowires (NWs) is investigated following a combined experimental
and modeling approach. By comparing and simulating the electrical
characteristics of single NW devices with different contact configurations
and by considering Ag and Pt electrodes as representative of electrochemically
active and inert electrodes, respectively, we highlight the importance
of an appropriate choice of electrode materials by taking into account
the Schottky barrier height and interface chemistry at the metal–insulator
interfaces. In particular, we show that a clever choice of metal–insulator
interfaces allows to reshape the hysteretic conduction characteristics
of the device and to increase the device performance by tuning its
resistance window. These results obtained from single NW-based devices
provide new insights into the selection criteria for materials and
interfaces in connection with the design of advanced ECM cells.