Quantum dot photolithography using a quantum dot photoresist composed of an organic–inorganic hybrid coating layer

Abstract

Quantum dots (QDs) have emerged as an important class of material due to their excellent photonic properties and durability for diverse applications such as solid-state lighting, energy conversion, display, biomedicine,...

Progress in the Development of Active-Matrix Quantum-Dot Light-Emitting Diodes Driven by Non-Si Thin-Film Transistors

“…However, there are several problems, for instance, physical damage to underlying QD and organic layers during photoresist (PR) deposition, development and removal processes, degradation of QDs by UV exposure, and defect formation from PR residues. Although full-color, high-resolution QLEDs could be demonstrated based on photolithography, the procedure to minimize the damages is exceedingly complicated [ 142 , 143 ]. Recently, a direct QD patterning method has been reported, which is a technique for patterning QDs based on photolithography but without the PR processes [ 131 , 144 , 145 , 146 , 147 , 148 ].…”

Lasing by Template‐Assisted Self‐Assembled Quantum Dots

“…[43][44][45][46][47][48][49][50][51][52][53][54][55] Being relatively straightforward, such an approach relies on elaborated substrate preparation and does not allow for creating multicomponent systems. To circumvent that, various direct micro-and nanopatterning techniques were introduced, such as template stripping, [56] electron-beam lithography (EBL), [57][58][59][60] laser ablation, [61] photolithography on the blends of QDs and photosensitive polymer [62,63] or nanoimprinting of the composites of QDs and high-refractive index-matrixes. [64] Still, most of these methods either rely on templates produced with EBL that highly increase manufacturing costs or require the presence of bulk polymers, impeding the inter-particle coupling and reducing the mode confinement.…”

Patternable quantum dot color conversion film based on photolithography technique

“…synthesized InP/ZnSe/ZnS QDs for photo-emissive color conversion, and showed great potential for the fabrication of a high-quality QD color filter. Myeong et al 32 . developed various process parameters for the QD photolithography with the custom QD photoresist, and the chromaticity of the QD photoresist in CIE 1931 color space covered 98.7% of the NTSC (1987) area.…”

“…Chen et al 31 synthesized InP/ZnSe/ZnS QDs for photo-emissive color conversion, and showed great potential for the fabrication of a high-quality QD color filter. Myeong et al 32 developed various process parameters for the QD photolithography with the custom QD photoresist, and the chromaticity of the QD photoresist in CIE 1931 color space covered 98.7% of the NTSC (1987) area. Shi et al proposed the combination method of a microscale fluorescence spectroscopy with machine learning which could realize the "massive detection" of QD color conversion films for micro-LEDs.…”