2018
DOI: 10.1038/s41565-018-0082-6
|View full text |Cite|
|
Sign up to set email alerts
|

Quantum engineering of transistors based on 2D materials heterostructures

Abstract: Quantum engineering entails atom-by-atom design and fabrication of electronic devices. This innovative technology that unifies materials science and device engineering has been fostered by the recent progress in the fabrication of vertical and lateral heterostructures of two-dimensional materials and by the assessment of the technology potential via computational nanotechnology. But how close are we to the possibility of the practical realization of next-generation atomically thin transistors? In this Perspect… Show more

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

2
276
0
3

Year Published

2018
2018
2023
2023

Publication Types

Select...
8
1

Relationship

3
6

Authors

Journals

citations
Cited by 377 publications
(281 citation statements)
references
References 90 publications
(127 reference statements)
2
276
0
3
Order By: Relevance
“…3(c) and 3(d)). The nFETs based on PdS 2 and PtS 2 exhibit expected τ and PDP compliant with IRDS requirements for next technology nodes, 10,29 together with an I on /I off ratio close to 10 4 for channel lengths of at least 10 nm, which implies acceptable stand-by power consumption for HP applications. 29 The pFETs have slightly worse PDP and τ than the nFETs, due to the smaller source DOS in the valence band -apparent in Fig.…”
Section: Resultsmentioning
confidence: 82%
See 1 more Smart Citation
“…3(c) and 3(d)). The nFETs based on PdS 2 and PtS 2 exhibit expected τ and PDP compliant with IRDS requirements for next technology nodes, 10,29 together with an I on /I off ratio close to 10 4 for channel lengths of at least 10 nm, which implies acceptable stand-by power consumption for HP applications. 29 The pFETs have slightly worse PDP and τ than the nFETs, due to the smaller source DOS in the valence band -apparent in Fig.…”
Section: Resultsmentioning
confidence: 82%
“…13 There is an additional advantage of some noble TMDs in their bilayer form: their density of states (DOS) exhibits a steep non-monotonic variation around the Fermi energy that can be used as an energy filtering mechanism in order to obtain a subthreshold swing (SS) of the FET smaller than the Boltzmann limit of 60 mV/decade at room temperature. Indeed, in thermionic FETs the inverse of the maximum slope of the current-voltage characteristics is limited to SS= k B T /q ln (10) per decade, where k B is Boltzmann constant, q is the elementary charge, and T is the absolute temperature. [21][22][23] This provides a room temperature SS value of = 60 mV/decade.…”
mentioning
confidence: 99%
“…It is formed by stacking the 2D materials layerby-layer via mechanical transfer. [74] Even it is challenging to prepare samples using CVD, the CVD technique is promising for semiconductor industry. [73] To date, the exfoliation is still the most successful method.…”
Section: Vertical Van Der Waals Heterojunctionsmentioning
confidence: 99%
“…Graphene is a two‐dimensional material with potential applications in various fields, for example, electronics, optoelectronics, energy and polymer composites . The large scale production of graphene, as well as other 2D materials, is still an open issue, both at the academic and particularly at the industrial level, to guarantee its promising for the aforementioned applications .…”
Section: Introductionmentioning
confidence: 99%