1989
DOI: 10.1063/1.101222
|View full text |Cite
|
Sign up to set email alerts
|

Quantum wires in InGaAs/InP fabricated by holographic photolithography

Abstract: Quantum wires ≊300–400 Å wide were fabricated by holographic photolithography from a wafer having a single 100 Å InGaAs quantum well. The wires were then recoated with InP using atmospheric pressure organometallic vapor phase epitaxy, which resulted in a planar surface. A high-resolution scanning electron microscope showed little deterioration of the wires due to recoating. At moderate intensities ≊10 W/cm2, photoluminescence (PL) studies showed a small shift in energy (≊6 meV) and a slight line narrowing cons… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
5

Citation Types

0
6
0

Year Published

1990
1990
2015
2015

Publication Types

Select...
6
4

Relationship

0
10

Authors

Journals

citations
Cited by 56 publications
(6 citation statements)
references
References 14 publications
0
6
0
Order By: Relevance
“…In order to fabricate structures showing quantum effects various techniques such as wet or dry etching, ion beam implantation or milling, lithography, self-assembling or regrowth on processed samples have been investigated. [1][2][3][4][5][6] In the present article we describe the capability of direct nanoscale etching by focused ion beam ͑FIB͒ as one of the possible and useful methods for forming submicron structures like quantum dots ͑QDs͒ and quantum wires ͑QWs͒. The main attraction of FIB is that it may eliminate the dependence on the conventional mask/resist processing, allow the controllability of position, size, and density of patterns, and is applicable to any kind of material.…”
Section: Introductionmentioning
confidence: 97%
“…In order to fabricate structures showing quantum effects various techniques such as wet or dry etching, ion beam implantation or milling, lithography, self-assembling or regrowth on processed samples have been investigated. [1][2][3][4][5][6] In the present article we describe the capability of direct nanoscale etching by focused ion beam ͑FIB͒ as one of the possible and useful methods for forming submicron structures like quantum dots ͑QDs͒ and quantum wires ͑QWs͒. The main attraction of FIB is that it may eliminate the dependence on the conventional mask/resist processing, allow the controllability of position, size, and density of patterns, and is applicable to any kind of material.…”
Section: Introductionmentioning
confidence: 97%
“…[65][66][67][68][69] The lowdimensional hetero-structures based on various materials are widely investigated because of the enhancement of carrier mobility. 70 These properties make such structures suitable for applications in QW lasers, 71 hetero-junction FETs, 72 73 high-speed digital networks, 74 high-frequency microwave circuits, 75 optical modulators, 76 optical switching systems, 77 and other devices.…”
Section: Introductionmentioning
confidence: 99%
“…20 In QWs the restriction of the motion of the carriers in the direction normal to the film (say, the z direction) may be viewed as carrier confinement in an infinitely deep one dimensional (1D) rectangular potential well, leading to quantization [known as quantum size effect (QSE)] of the wave vector of the carrier along the direction of the potential well, allowing 2D carrier transport parallel to the surface of the film representing new physical features not exhibited in bulk semiconductors. [65][66][67][68][69] The lowdimensional hetero-structures based on various materials are widely investigated because of the enhancement of carrier mobility. 70 These properties make such structures suitable for applications in QW lasers, 71 hetero-junction FETs, 72 73 high-speed digital networks, 74 high-frequency microwave circuits, 75 optical modulators, 76 optical switching systems, 77 and other devices.…”
Section: Introductionmentioning
confidence: 99%