1993
DOI: 10.1016/0921-5093(93)90353-g
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R.f. magnetron sputtered iridium coatings on carbon structural materials

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Cited by 54 publications
(36 citation statements)
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“…Electro-chemical deposition, magnetron sputtering, and metal-organic chemical vapor deposition (MOCVD) processes have been successfully used for the deposition of Ir coatings. [3][4][5] CVD is one of the most dynamically developing methods of forming metal layers for different purposes. Compared with the coatings prepared by electrodeposition and magnetron sputtering, the coatings deposited by MOCVD have smaller grain size and different grain structure.…”
Section: 2mentioning
confidence: 99%
See 1 more Smart Citation
“…Electro-chemical deposition, magnetron sputtering, and metal-organic chemical vapor deposition (MOCVD) processes have been successfully used for the deposition of Ir coatings. [3][4][5] CVD is one of the most dynamically developing methods of forming metal layers for different purposes. Compared with the coatings prepared by electrodeposition and magnetron sputtering, the coatings deposited by MOCVD have smaller grain size and different grain structure.…”
Section: 2mentioning
confidence: 99%
“…4,[19][20][21][22][23] Obvious advantages of sputtered thin lms are simplicity of the method and material purity as well as capability to form metal silicides being deposited on silicon and thermally annealed. It seems that only sputtered lms can serve as a reference for comparison of CVD thin lm composition and properties.…”
Section: 18mentioning
confidence: 99%
“…[1][2][3]11 Due to the strong influence of morphology on film properties, film microstructure is an important property to consider for both optical and microelectronic applications. Moreover, environmental stability depends strongly on film morphology as well.…”
Section: Introductionmentioning
confidence: 99%
“…1,2 Ir is of great interest because of its unique properties, including a high melting point (ϳ2713 K), low oxygen permeability, high chemical stability, and good electric conductivity, to name a few. [1][2][3][4] As a result, it is currently being considered by NASA as a substrate ͑Ir on fused silica͒ for use in space contamination studies. 5,6 For use in space, Ir films with excellent surface qualities are necessary, including extremely low surface roughness and superb stability in the adverse environment in space.…”
Section: Introductionmentioning
confidence: 99%
“…Among candidate materials, iridium seems promising because of its unique properties, including smooth surfaces, high melting point ͑ϳ2713 K͒, low vapor pressure, low oxygen permeability, and high chemical stability, to name a few. [4][5][6][7] For use in space, the substrate itself has to have superb stability in the adverse environment in space.…”
Section: Introductionmentioning
confidence: 99%