1992
DOI: 10.1016/0921-5107(92)90250-d
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Radiation damage and amorphization of silicon by 2 MeV nitrogen ion implantation

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Cited by 3 publications
(1 citation statement)
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“…As in the analogous representation of graphite, the Si-vertexSi (or C-vertex-C) angle is constrained to be 180˚ if (in this case) the 109.5˚ tetrahedral bond angles are to be maintained; to the extent that the tetrahedral angle can be altered, the structure approaches the topological freedom (f = 0) of the {4,2} network of SiO 2 . The experimental amorphizability of Si (11 eV/atom [67], Table 1) suggests a value close to f = 0. Hence, amorphization of silicon must also be accompanied by bond-angle changes.…”
Section: Silicon and Diamondmentioning
confidence: 99%
“…As in the analogous representation of graphite, the Si-vertexSi (or C-vertex-C) angle is constrained to be 180˚ if (in this case) the 109.5˚ tetrahedral bond angles are to be maintained; to the extent that the tetrahedral angle can be altered, the structure approaches the topological freedom (f = 0) of the {4,2} network of SiO 2 . The experimental amorphizability of Si (11 eV/atom [67], Table 1) suggests a value close to f = 0. Hence, amorphization of silicon must also be accompanied by bond-angle changes.…”
Section: Silicon and Diamondmentioning
confidence: 99%