2015 IEEE International Integrated Reliability Workshop (IIRW) 2015
DOI: 10.1109/iirw.2015.7437091
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Radiation testing of tantalum oxide-based resistive memory

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Cited by 3 publications
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“…With very thin switching layers, often between 10-100 nm, and a switching mechanism based on conductive filaments rather than control of charge density, RRAM cells can be considered radiation hard by process [91]- [101]. However, Fig.…”
Section: Resistive Random Access Memorymentioning
confidence: 99%
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“…With very thin switching layers, often between 10-100 nm, and a switching mechanism based on conductive filaments rather than control of charge density, RRAM cells can be considered radiation hard by process [91]- [101]. However, Fig.…”
Section: Resistive Random Access Memorymentioning
confidence: 99%
“…In VCM, there are three main materials that have been the focus of research to date; TaO x , HfO x , and TiO x although some research into SiO x has also been conducted [92]- [94], [96], [99], [101]- [109]. Over the years, variations in radiation responses between different or even the same materials has been reported.…”
Section: Resistive Random Access Memorymentioning
confidence: 99%
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