Radical kinetics for polymer film deposition in fluorocarbon (C4F8, C3F6 and C5F8) plasmas

Takahashi, Kazuo; Itoh, Atsushi; Nakamura, Toshihiro; Tachibana, Kunihide

doi:10.1016/s0040-6090(00)01160-3

Cited by 86 publications

(58 citation statements)

References 17 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The C (1s) peak profile for a specific set of plasma operating conditions was very reproducible regardless of the base substrate used (Au, Si, or HOPG) or the sample position in the plasma reactor during layer deposition. Similar results have been also reported in the literature for plasma deposition on Si substrates from a C 4 F 8 gas source but at different conditions [5][6][7] .…”

Section: S3supporting

confidence: 90%

Nanoelectrode Scanning Probes from Fluorocarbon-Coated Single-Walled Carbon Nanotubes

et al. 2004

View full text Add to dashboard Cite

Surface Analysis of Fluorocarbon Thin Films with XPS and Ellipsometry:Ellipsometric measurements were performed at λ= 632.8 nm with a Gaertner L116C ellipsometer. XPS characterization was carried out using a Kratos Ultra System with a monochromatic Al K α X-ray source. Spectra were acquired in the constant analyzer energy mode using pass energies of 160 eV for survey spectra and 20 eV for high Table 1. For the ellipsometry measurements, the complex refractive index for the transparent fluorocarbon polymer was taken to be n=1.4 and k=0. 1 The substrate refractive indices for the model surfaces were taken to be: Si (n=3.85, k=0.2), Au (n=0.13, k=3.16) and HOPG (n= 2.91, k=1.71). 2 The model used to

show abstract

Section: S3supporting

confidence: 90%

Nanoelectrode Scanning Probes from Fluorocarbon-Coated Single-Walled Carbon Nanotubes

et al. 2004

View full text Add to dashboard Cite

show abstract

“…31 The cubic phase of Cu 2 O is basically an interpenetrating network that may be stabilized by covalent Cu-Cu bonding. 44,45 The Cu-Cu interaction in the oxide requires a longer cutoff than was used by Yu et al, which in turn necessitates a refit of several parameters. The copper parameters at neutral charge are determined as the weighted least squares best fit to experimental cohesive energy and lattice parameter of the FCC ground state.…”

Section: Parameterization Of Atomic and Metallic Coppermentioning

confidence: 99%

Atomistic simulations of copper oxidation and Cu/Cu2O interfaces using charge-optimized many-body potentials

et al. 2011

View full text Add to dashboard Cite

Presented is a charge optimized many body potential (COMB) for metallic copper and copper oxide systems based on an extended Tersoff formalism coupled with variable charge electrostatics. To faithfully reproduce interactions between molecular oxygen and the metal surface, the potential includes atomic polarizabilities via both a point dipole model and dynamic partial charges, both of which are equilibrated through an extended Lagrangian scheme. The potential is fit to a training set composed of both experimental and ab initio computational data for cohesive energies, formation enthalpies, elastic properties and surface energies of several metallic and oxide phases as well as bond dissociation energies for molecular oxygen and several of its anions. The potential is used in molecular dynamics simulations to model the Cu(111)||Cu 2 O(100) interface and the oxidation of the Cu(100) surface.

show abstract

“…The deposit of a non-homogeneous layer for treatment time less than about 80 s was responsible for the slow change in u H 2 O observed. Nevertheless, the polymerization time to obtain these hydrophobic coatings remains very short [19].…”

Section: Wettability Of the Surfacementioning

confidence: 99%

“…The deposition rate was in the range from 2 to 10 mg min À1 cm À2 for PFH and PFO, and from 5 to 30 mg min À1 cm À2 for NFH and TDFO. The more rapid deposition of the unsaturated monomers can be partly due to the high reactivity of the double bond [19].…”

Section: Wettability Of the Surfacementioning

confidence: 99%

Fluorinated-plasma coating on polyhydroxyalcanoate PHBV

Guerrouani

Baldo

Maarouf

et al. 2007

Journal of Fluorine Chemistry

View full text Add to dashboard Cite

Radical kinetics for polymer film deposition in fluorocarbon (C4F8, C3F6 and C5F8) plasmas

Cited by 86 publications

References 17 publications

Nanoelectrode Scanning Probes from Fluorocarbon-Coated Single-Walled Carbon Nanotubes

Nanoelectrode Scanning Probes from Fluorocarbon-Coated Single-Walled Carbon Nanotubes

Atomistic simulations of copper oxidation and Cu/Cu2O interfaces using charge-optimized many-body potentials

Fluorinated-plasma coating on polyhydroxyalcanoate PHBV

Contact Info

Product

Resources

About