Radio frequency plasma deposited boron doped high conductivity p-type nano crystalline silicon oxide thin film for solar cell window layer

Shin, Chonghoon; Iftiquar, S.M.; Park, Jinjoo; Ahn, Shihyun; Kim, Sangho; Jung, Junhee; Bong, Sungjae; Yi, Junsin

doi:10.1016/j.matchemphys.2015.03.053

Cited by 25 publications

(12 citation statements)

References 23 publications

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“…Immediately before depositing the intrinsic amorphous silicon (a-Si:H) passivation layer, native oxides on the surfaces of the wafers were removed by dipping into l% hydrofluoric acid for one minute. Intrinsic a-Si:H 34 and doped silicon oxide layers 26 , 35 were deposited using a cluster-type multi chamber plasma-enhanced chemical vapor deposition (PECVD) system. A schematic diagram of the layer structure of the solar cells is shown in Fig.…”

Section: Methodsmentioning

confidence: 99%

“…A variation in the oxygen content of intrinsic or doped silicon oxide materials 26 – 28 , 30 , 35 can alter their optical absorption, optical band-gap and refractive index. Therefore, we varied the oxygen content in the n-µc-SiO:H layer by varying the CO 2 flow rate during film deposition, so that more light can be coupled into the solar cell, thereby enhancing electrical output from the device.…”

Section: Methodsmentioning

confidence: 99%

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Improving the efficiency of rear emitter silicon solar cell using an optimized n-type silicon oxide front surface field layer

Kim

Park

Pham

et al. 2018

Sci Rep

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Optical and electrical characteristics of n-type nano-crystalline-silicon oxide (n-µc-SiO:H) materials can be varied to optimize and improve the performance of a solar cell. In silicon heretojunction (SHJ) solar cells, it can be used to improve carrier selectivity and optical transmission at the front side, both of which are vitally important in device operation. For this purpose, the n-µc-SiO:H was investigated as the front surface field (FSF) layer. During film deposition, an increased CO2 flow rate from 0 to 6 sccm resulted in changes of crystalline volume fractions from 57 to 28%, optical band-gaps from 1.98 to 2.21 eV, dark conductivities from 7.29 to 1.1 × 10−5 S/cm, and activation energies from 0.019 to 0.29 eV, respectively. In device applications, a minimum optical reflection was estimated for the FSF layer that was fabricated with 4 sccm CO2 (FSF-4), and therefore obtained the highest external quantum efficiency, although short circuit current density (Jsc) was 38.83 mA/cm2 and power conversion efficiency (PCE) was 21.64%. However, the highest PCE of 22.34% with Jsc = 38.71 mA/cm2 was observed with the FSF prepared with 2 sccm CO2 (FSF-2), as the combined opto-electronic properties of FSF-2 were better than those of the FSF-4.

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Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

Improving the efficiency of rear emitter silicon solar cell using an optimized n-type silicon oxide front surface field layer

Kim

Park

Pham

et al. 2018

Sci Rep

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“…The deposition pressure was set to 4 mbar. Silane (SiH 4 ), hydrogen (H 2 ), methane (CH 4 ), and carbon dioxide (CO 2 ) served as precursor gases and the n-and p-type doping of the films were achieved by adding phosphine PH 3 or trimethylborane B(CH 3 ) 3 , respectively. The composition of the gas mixture during the deposition was characterized by the silane concentration SC and the CO 2 gas flow ratio r CO2 , defined by and , respectively.…”

Section: Methodsmentioning

confidence: 99%

“…As a result, nc-SiO x :H is widely applicable as a window, back contact (BC) or intermediate reflector (IR) layer in various solar cell concepts. So far, ncSiO x :H has been utilized in photovoltaic devices like thin-film (TF) silicon solar cells [3,[9][10][11], multi-junction solar cells [12][13][14], crystalline silicon solar cells with diffused emitters [6], and silicon heterojunction (SHJ) solar cells [15][16][17][18]. Each of these applications requires specific optoelectronic properties in order to improve the overall spectral utilization and the response of the solar cell.…”

Section: Introductionmentioning

confidence: 99%

Versatility of doped nanocrystalline silicon oxide for applications in silicon thin-film and heterojunction solar cells

Richter

Smirnov

Lambertz

et al. 2018

Solar Energy Materials and Solar Cells

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To optimize the optical response of a solar cell, specifically designed materials with appropriate optoelectronic properties are needed. Owing to the unique microstructure of doped nanocrystalline silicon oxide, nc-SiO x :H, this material is able to cover an extensive range of optical and electrical properties. However, applying nc-SiO x :H thin-films in photovoltaic devices necessitates an individual adaptation of the material properties according to the specific functions in the device. In this study, we investigated the detailed microstructure of doped nc-SiO x :H films via atom probe tomography at the sub-nm scale, thereby, for the first time, revealing the three-dimensional distribution of the nc-Si network. Furthermore, n-and p-type nc-SiO x :H layers with various optical and electrical properties were implemented as a window, back contact, and an intermediate reflector layer in silicon heterojunction and multi-junction thin-film solar cells with a focus on the key aspects for adapting the material properties to the specific functions. Here, nc-SiO x :H effectively reduced the parasitic absorption and opened new possibilities for the photon management in the solar cells, thereby, demonstrating the versatility of this material. Remarkably, using our adapted nc-SiO x :H layers in distinct functions enabled us to achieve a combined short circuit current density of 15.1 mA cm -2 for the two a-Si:H sub-cells in an a-Si:H/a-Si:H/µc-Si:H triplejunction thin-film solar cell and an active area efficiency of 21.4 % was realized for a silicon heterojunction solar cell.2

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“…2 Among various types of textured front surfaces, the pyramidally textured surface is a popular one. 26 Texturing the front surface (e.g., glass surface) of a solar cell can be helpful in raising current density. [4][5][6] Two major components in this respect are textured front surface and back reflector.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of honeycomb textured glass substrate and nanotexturing of zinc oxide front electrode for its application in high efficiency thin film amorphous silicon solar cell

et al. 2017

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Fabrication of honeycomb textured glass substrate and nanotexturing of zinc oxide front electrode for its application in high efficiency thin film amorphous silicon solar cell," Abstract. A significant part of broad band sunlight remains unabsorbed in a simple structured amorphous silicon solar cell. This absorption can be enhanced by adopting a light-trapping scheme with the help of a textured front surface and back reflector. For this purpose, honeycomb-type texture was fabricated on a glass surface by chemical etching. A 3 μm × 3 μm honeycomb patterned optical-mask was used to create an image-pattern of an etch-mask on the glass surfaces. We used 0.5% hydrofluoric acid (HF) as an etchant solution with an optimized etching time ranging between 25 and 28 min. This single textured glass shows an enhancement in diffused transmission of light. In solar cell application, a 630-nm-thick Al-doped ZnO (AZO) layer was deposited over the textured glass surface. An additional random etching was carried out on the AZO with 1% HF acid solution for 10 s. This results to a double textured AZO superstrate on which solar cells were fabricated. The solar cells show higher short circuit current density to 17.2 mA∕cm 2 . Finally, we obtained photovoltaic conversion efficiency of an optimized solar cell as 10.75% (with the corresponding J sc as 17.03 mA∕cm 2 ). Downloaded From: http://photonicsforenergy.spiedigitallibrary.org/pdfaccess.ashx?url=/data/journals/photoe/936171/ on 04/23/2017 Terms of Use: http://spiedigitallibrary.org/s Park et al.: Fabrication of honeycomb textured glass substrate and nanotexturing. Downloaded From: http://photonicsforenergy.spiedigitallibrary.org/pdfaccess.ashx?url=/data/journals/photoe/936171/ on 04/23/2017 Terms of Use: http://spiedigitallibrary.org/s Park et al.: Fabrication of honeycomb textured glass substrate and nanotexturing. Downloaded From: http://photonicsforenergy.spiedigitallibrary.org/pdfaccess.ashx?url=/data/journals/photoe/936171/ on 04/23/2017 Terms of Use: http://spiedigitallibrary.org/s Park et al.: Fabrication of honeycomb textured glass substrate and nanotexturing. Downloaded From: http://photonicsforenergy.spiedigitallibrary.org/pdfaccess.ashx?url=/data/journals/photoe/936171/ on 04/23/2017 Terms of Use: http://spiedigitallibrary.org/s Park et al.: Fabrication of honeycomb textured glass substrate and nanotexturing. Downloaded From: http://photonicsforenergy.spiedigitallibrary.org/pdfaccess.ashx?url=/data/journals/photoe/936171/ on 04/23/2017 Terms of Use: http://spiedigitallibrary.org/s Park et al.: Fabrication of honeycomb textured glass substrate and nanotexturing. Downloaded From: http://photonicsforenergy.spiedigitallibrary.org/pdfaccess.ashx?url=/data/journals/photoe/936171/ on 04/23/2017 Terms of Use: http://spiedigitallibrary.org/s Park et al.: Fabrication of honeycomb textured glass substrate and nanotexturing. Downloaded From: http://photonicsforenergy.spiedigitallibrary.org/pdfaccess.ashx?url=/data/journals/photoe/936171/ on 04/23/2017 Terms of Use: http://spiedigital...

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Radio frequency plasma deposited boron doped high conductivity p-type nano crystalline silicon oxide thin film for solar cell window layer

Cited by 25 publications

References 23 publications

Improving the efficiency of rear emitter silicon solar cell using an optimized n-type silicon oxide front surface field layer

Improving the efficiency of rear emitter silicon solar cell using an optimized n-type silicon oxide front surface field layer

Versatility of doped nanocrystalline silicon oxide for applications in silicon thin-film and heterojunction solar cells

Fabrication of honeycomb textured glass substrate and nanotexturing of zinc oxide front electrode for its application in high efficiency thin film amorphous silicon solar cell

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