2013
DOI: 10.1016/j.surfcoat.2013.06.013
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Raman analysis of DLC and Si-DLC films deposited on nitrile rubber

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Cited by 44 publications
(37 citation statements)
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“…DLC thin films have been prepared by various methods including pulsed laser deposition [8], ion beam sputtering [9], plasma enhanced chemical vapour deposition (PECVD) [10] and magnetron sputtering (MS) [11]. In this field, Lubwama et al [12][13][14][15] used a combination of closed field unbalanced magnetron sputtering ion plating and PECVD with an Ar/C 4 H 10 plasma to deposit DLC and Si-DLC films with and without Si-C interlayer onto nitrile rubber at a low substrate bias of −30 V and investigated the triboperformance of DLC and Si-DLC films. Pei et al [16] investigated the influence of the bias voltage of MS plasma cleaning and the pulse direct current of plasma chemical vapour deposition on DLC films and provided generic design rules for the deposition of flexible and ultralow friction DLC films on rubber seals.…”
Section: Introductionmentioning
confidence: 99%
“…DLC thin films have been prepared by various methods including pulsed laser deposition [8], ion beam sputtering [9], plasma enhanced chemical vapour deposition (PECVD) [10] and magnetron sputtering (MS) [11]. In this field, Lubwama et al [12][13][14][15] used a combination of closed field unbalanced magnetron sputtering ion plating and PECVD with an Ar/C 4 H 10 plasma to deposit DLC and Si-DLC films with and without Si-C interlayer onto nitrile rubber at a low substrate bias of −30 V and investigated the triboperformance of DLC and Si-DLC films. Pei et al [16] investigated the influence of the bias voltage of MS plasma cleaning and the pulse direct current of plasma chemical vapour deposition on DLC films and provided generic design rules for the deposition of flexible and ultralow friction DLC films on rubber seals.…”
Section: Introductionmentioning
confidence: 99%
“…The residual stress of the DLC coating was measured by Raman shift. Equation (1) shows the relationship between residual stress s r and Raman shift as follows (Wei et al, 1999;Lubwama et al, 2013):…”
Section: Residual Stressmentioning
confidence: 99%
“…We used a special mounting to hold the piston seals during film deposition; this sample holder was rotated at a speed of 5 rotations per minute. Detailed description of the deposition process has been presented elsewhere (Lubwama et al, 2012a;Lubwama et al, 2012b;Lubwama et al, 2013;Lubwama et al, 2014).…”
Section: Deposition Of Dlc and Si-dlc Filmsmentioning
confidence: 99%