2018 International Semiconductor Conference (CAS) 2018
DOI: 10.1109/smicnd.2018.8539747
|View full text |Cite
|
Sign up to set email alerts
|

Raman Investigation of Critical Steps in Monolayer Graphene Transfer Form Copper Substrate to Oxidized Silicon by Means of Electrochemical Delamination

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2020
2020
2021
2021

Publication Types

Select...
2

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(2 citation statements)
references
References 10 publications
0
2
0
Order By: Relevance
“…As result, substrate of copper can be used constantly. Arrays of single-crystal graphene islands over 10 mm in size were achieved [203,204]. Graphene wet-transferred room temperature Raman spectra on three separate substrates (Cu, SiO 2 / Si) shows the basic Raman modes of graphene at about 1580 cm −1 due to the inner vibration of C-C bond.…”
Section: Discussionmentioning
confidence: 99%
“…As result, substrate of copper can be used constantly. Arrays of single-crystal graphene islands over 10 mm in size were achieved [203,204]. Graphene wet-transferred room temperature Raman spectra on three separate substrates (Cu, SiO 2 / Si) shows the basic Raman modes of graphene at about 1580 cm −1 due to the inner vibration of C-C bond.…”
Section: Discussionmentioning
confidence: 99%
“…After graphene transfer, cracks, wrinkles, residue, and contamination are commonly observed, which degrade the quality of the graphene available for the application [11,12]. The sources of the residue and contamination are the sacrificial substrate (e.g., Cu foil); etchant used to dissolve the sacrificial substrate (e.g., ammonium persulfate (APS)); and the support layer (usually organic polymers such as polymethyl methacrylate (PMMA)) that also favors wrinkle formations and produces the most undesirable type of residue owing to the compatible interaction of the polymers with graphene [13][14][15][16].…”
Section: Introductionmentioning
confidence: 99%