2012
DOI: 10.1143/jjap.51.04dc08
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Random Interface-Traps-Induced Electrical Characteristic Fluctuation in 16-nm-Gate High-κ/Metal Gate Complementary Metal–Oxide–Semiconductor Device and Inverter Circuit

Abstract: Within the framework of the thermally activated process of the flux line or flux line bundles, and by time integration of the 1D equation of motion of the circulating current density J (ρ, t), which is suitable for thin superconducting films (R d, λ), we present numerical calculations of the current profiles, magnetization hysteresis loops and ac susceptibility χ n = χ n + iχ n for n = 1, 3 and 5 of a thin disc immersed in an axial time-dependent external magnetic field B a (t) = B dc + B ac cos(2πνt). Our cal… Show more

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Cited by 3 publications
(1 citation statement)
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“…In this simulation, we utilized a calibrated mobility model, in particular, we intensively employed 3-D quantum mechanically corrected device simulations to evaluate device characteristics [35]. For validation purposes, we examined the conduction band energy and electron density along the channel during on and off states by numerically solving the 3-D density gradient equation along with drift-diffusion (DG+DD) and nonequilibrium Green's functions (NEGF) models [36][37][38][39]. Not shown here, but by adjusting the electron effective mass, the simulation results of the DG+DD model are in good agreement with those of the NEGF model [40].…”
Section: -D Device Simulationmentioning
confidence: 99%
“…In this simulation, we utilized a calibrated mobility model, in particular, we intensively employed 3-D quantum mechanically corrected device simulations to evaluate device characteristics [35]. For validation purposes, we examined the conduction band energy and electron density along the channel during on and off states by numerically solving the 3-D density gradient equation along with drift-diffusion (DG+DD) and nonequilibrium Green's functions (NEGF) models [36][37][38][39]. Not shown here, but by adjusting the electron effective mass, the simulation results of the DG+DD model are in good agreement with those of the NEGF model [40].…”
Section: -D Device Simulationmentioning
confidence: 99%