Rapid Directed Assembly of Block Copolymer Films at Elevated Temperatures

Welander, Adam M.; Kang, Huiman; Stuen, Karl O.; Solak, Harun H.; Müller, Marcus; Pablo, Juan J. de; Nealey, Paul F.

doi:10.1021/ma800056s

Cited by 156 publications

(183 citation statements)

References 34 publications

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“…However, this technique still requires a long thermal annealing stage for the block copolymer layer to conform to the underlying surface relief pattern. Relatively recently, Welander et al 208 used high temperature annealing ($250 C) alongside a chemically nanopatterned surface to achieve rapid ordering ($1-5 min) of a lamellar-forming PS-block-PMMA diblock that has in the past taken many hours.…”

Section: Processingmentioning

confidence: 99%

Block copolymer strategies for solar cell technology

Topham¹,

Parnell²,

Hiorns³

2011

J Polym Sci B Polym Phys

186

169

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A simple overview of the methods used and the expected benefits of block copolymers in organic photovoltaic devices is given in this review. The description of the photovoltaic process makes it clear how the detailed self-assembly properties of block copolymers can be exploited. Organic photovoltaic technology, an inexpensive, clean and renewable energy source, is an extremely promising option for replacing fossil fuels. It is expected to deliver printable devices processed on flexible substrates using high-volume techniques. Such devices, however, currently lack the long-term stability and efficiency to allow organic photovoltaics to surpass current technologies. Block copolymers are envisaged to help overcome these obstacles because of their long term structural stability and their solid-state morphology being of the appropriate dimensions to efficiently perform charge collection and transfer to electrodes.

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Section: Processingmentioning

confidence: 99%

Block copolymer strategies for solar cell technology

Topham¹,

Parnell²,

Hiorns³

2011

J Polym Sci B Polym Phys

186

169

View full text Add to dashboard Cite

show abstract

“…An example is illustrated in Fig. 2d, which shows the result of DSA performed at an ARTICLE elevated temperature (265°C, 5 min, film thickness H ¼ 1.2 L 0 ) to accelerate BCP ordering 29 , with excellent rectification above the masking feature, and which generates well-defined customizations on pattern transfer and tone inversion (Fig. 2e).…”

Section: Resultsmentioning

confidence: 99%

Enabling complex nanoscale pattern customization using directed self-assembly

et al. 2014

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Block copolymer directed self-assembly is an attractive method to fabricate highly uniform nanoscale features for various technological applications, but the dense periodicity of block copolymer features limits the complexity of the resulting patterns and their potential utility. Therefore, customizability of nanoscale patterns has been a long-standing goal for using directed self-assembly in device fabrication. Here we show that a hybrid organic/inorganic chemical pattern serves as a guiding pattern for self-assembly as well as a self-aligned mask for pattern customization through cotransfer of aligned block copolymer features and an inorganic prepattern. As informed by a phenomenological model, deliberate process engineering is implemented to maintain global alignment of block copolymer features over arbitrarily shaped, 'masking' features incorporated into the chemical patterns. These hybrid chemical patterns with embedded customization information enable deterministic, complex two-dimensional nanoscale pattern customization through directed self-assembly.

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“…Furthermore, annealing condition and BCP film thickness are also affects the orientation of BCP domains. 150 °C for 1 minute annealing condition is milder than that for PS-b-PMMA [23]. On the other hand, a suitable BCP thickness for achieving perpendicularly oriented cylinders was reported [24].…”

Section: Orientation Control In Thin Filmmentioning

confidence: 91%

Perpendicularly Oriented Cylinders of Si-containing Block Copolymers by Atmospheric Thermal Annealing

Seshimo¹,

Odashima

Maeda

et al. 2016

J. Photopol. Sci. Technol.

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The directed self-assembly (DSA) of block copolymers (BCPs) can realize as one of candidates for next generation lithography. The BCPs for DSA should exhibit a high resolution, an ability to form perpendicularly oriented domains in the thin film by thermal annealing under mild condition, and a high etching selectivity. Here, we report a new Si-containing BCPs targeted to form perpendicularly oriented cylinders in thin films. The hydroxyl groups in the side chains introduced in the Si-containing block provide a good surface free energy (SFE) balance leading to the perpendicular orientation. Furthermore, this orientation can be completed in only one minute atmospheric thermal annealing at 150 °C. Oxygen plasma etching for the thin films results in the achievement of hexagonally packed cylinders.

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Rapid Directed Assembly of Block Copolymer Films at Elevated Temperatures

Cited by 156 publications

References 34 publications

Block copolymer strategies for solar cell technology

Block copolymer strategies for solar cell technology

Enabling complex nanoscale pattern customization using directed self-assembly

Perpendicularly Oriented Cylinders of Si-containing Block Copolymers by Atmospheric Thermal Annealing

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