2012
DOI: 10.1143/jjap.51.070210
|View full text |Cite
|
Sign up to set email alerts
|

Rapid Reversible Degradation of Silicon Thin Films by a Treatment in Water

Abstract: The reactive ion etching (RIE) of the binary transition-metal oxides (TMOs) NiO, CuO and CoO, which are expected to be key materials of resistance random access memory (RRAMÔ), was investigated. We found that inductively coupled plasma using CHF 3 -based discharge, which is highly compatible with conventional semiconductor RIE, is effective for the TMOs studied here. Furthermore, device fabrication using Pt/CoO/Pt trilayers is carried out, and a large change in resistance, which is an essential functionality o… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
1
0
1

Year Published

2014
2014
2022
2022

Publication Types

Select...
3

Relationship

1
2

Authors

Journals

citations
Cited by 3 publications
(2 citation statements)
references
References 13 publications
0
1
0
1
Order By: Relevance
“…In addition, high purity oxygen gas treatment was performed in high vacuum cryostat at 80°C. In addition, deionized water at 80°C was used for faster and effective creation of reversible and irreversible changes in samples deposited on rough glass [14]. Annealing was carried out at 430 K in high vacuum of 2-3 × 10 −6 mbar.…”
Section: Methodsmentioning
confidence: 99%
“…In addition, high purity oxygen gas treatment was performed in high vacuum cryostat at 80°C. In addition, deionized water at 80°C was used for faster and effective creation of reversible and irreversible changes in samples deposited on rough glass [14]. Annealing was carried out at 430 K in high vacuum of 2-3 × 10 −6 mbar.…”
Section: Methodsmentioning
confidence: 99%
“…[4, 6,13,14,[16][17][18][19][20][21]. Nano ya da mikro kristal silisyumlarda oluşan bu elektronik bozunmalar tamamen geri dönüşümlü olabildiği gibi kısmi ya da tamamen geri dönüşümsüz etkiler de oluşturduğu literatüre rapor edilmiştir [6,13,14,19,20,22,[26][27][28][29].…”
Section: Introductionunclassified